A typical deposition temperature for DLC coatings is below 200°C. Specifically, HEF's specific deposition technology allows for the deposition of DLC coatings at around 170°C. DLC films can be deposited using the radio frequency plasma-assisted chemical vapor deposition (RF PECVD) method, which allows for the deposition of carbon films with a wide range of optical and electrical properties. The films have good adhesion to many substrates and can be deposited at relatively low temperatures. However, highly containing sp3 carbon films, known as polycrystalline diamond, are usually produced by high-temperature chemical vapor deposition (CVD) processes. Diamond-like carbon films (DLC), in their different forms, can be deposited at even lower temperatures of around 300°C with high adhesive strength using adequate bonding layers. Plasma-enhanced chemical vapor deposition (PECVD) can also be used to produce DLC coatings, which are hard, scratch-resistant, and have good barrier properties. PECVD offers advantages such as lower temperatures, chemical stability, fewer toxic byproducts, quick processing time, and high deposition rates. Overall, DLC coatings can be deposited at various temperatures depending on the specific deposition method and desired properties.
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