PVD TiN coatings are conventionally applied at temperatures between 400 and 500°C (750 to 930°F).
PVD processes rely on ion bombardment instead of high temperatures as the driving force.
The substrate to be coated is placed in a vacuum chamber and is heated to temperature.
The Ti coating material is vaporized and a reactive gas such as N2 is introduced and ionized.
The vaporized titanium atoms then react with the ionized nitrogen to form TiN compound that deposits on the substrate to form the coating.
Compared to CVD processes, PVD processes operate at much lower temperatures.
CVD processing temperatures are typically between 850 – 1100°C (1550 – 2000ºF).
PVD coatings are well suited for steels with higher tempering temperatures.
PVD coatings have a thinner thickness of about 3-5μm and lower processing temperatures of about 500°C.
This makes PVD coatings suitable for a wider range of substrates and applications, especially for base materials that are sensitive to higher temperature ranges.
PVD coatings also have the advantage of holding close tolerances and minimizing distortion on most materials.
In contrast, CVD coatings have higher temperature resistance requirements and are typically used on hard alloys such as cemented carbide due to the high processing temperatures (800-1000°C) involved.
Overall, the choice between PVD and CVD TiN coatings depends on the end use application temperature of the component.
Higher usage temperatures may make CVD coating methods more desirable, while PVD coatings are more versatile and suitable for a wider range of substrates and applications.
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