Knowledge What is atmospheric pressure chemical vapor deposition of graphene? (5 Key Points Explained)
Author avatar

Tech Team · Kintek Solution

Updated 1 month ago

What is atmospheric pressure chemical vapor deposition of graphene? (5 Key Points Explained)

Atmospheric pressure chemical vapor deposition (APCVD) of graphene is a method used to synthesize high-quality graphene films directly on substrates at atmospheric pressure.

This process involves the decomposition of hydrocarbon gases on a metal catalyst at high temperatures, leading to the formation of graphene layers.

5 Key Points Explained

What is atmospheric pressure chemical vapor deposition of graphene? (5 Key Points Explained)

1. Process Overview

In APCVD, a metal substrate such as copper, cobalt, or nickel is placed in a reaction chamber.

Hydrocarbon gases, such as methane or ethylene, are introduced into the chamber.

The chamber is heated to temperatures typically ranging from 800 to 1050 °C, causing the hydrocarbon gases to decompose into carbon atoms.

These carbon atoms then bond to the surface of the metal substrate, forming graphene layers.

2. Advantages of APCVD

APCVD can produce graphene films over large areas, which is crucial for many industrial applications.

The process parameters such as gas flow rate, temperature, and time can be adjusted to control the thickness and quality of the graphene layers.

APCVD allows for the direct synthesis of graphene on substrates, which can be advantageous for specific applications like electronics and optoelectronics.

3. Role of Metal Substrates

Metal substrates act as catalysts, lowering the energy barrier for the decomposition of hydrocarbon gases.

They also influence the deposition mechanism of graphene, affecting its quality and uniformity.

4. Physical Conditions and Carrier Gases

The atmospheric pressure in APCVD helps in maintaining a stable environment for the reaction, although lower pressures are often preferred for better uniformity and fewer unwanted reactions.

Carrier gases like hydrogen and argon are used to enhance the surface reaction and improve the rate of graphene deposition.

5. Applications and Future Prospects

APCVD-grown graphene is used in various applications including electronic transistors, transparent conductors, and corrosion coatings.

The development of APCVD techniques continues to evolve, focusing on improving the quality and scalability of graphene production for broader industrial adoption.

Continue exploring, consult our experts

Discover the cutting-edge potential of atmospheric pressure chemical vapor deposition (APCVD) with KINTEK SOLUTION. Our comprehensive range of high-quality materials and advanced process equipment enables the direct synthesis of large-area, top-tier graphene films.

Partner with us to unlock the advantages of APCVD for your applications, including enhanced large-area production, quality control, and direct substrate synthesis. Embrace innovation and join the forefront of graphene technology today!

Related Products

Drawing die nano-diamond coating HFCVD Equipment

Drawing die nano-diamond coating HFCVD Equipment

The nano-diamond composite coating drawing die uses cemented carbide (WC-Co) as the substrate, and uses the chemical vapor phase method ( CVD method for short ) to coat the conventional diamond and nano-diamond composite coating on the surface of the inner hole of the mold.

RF PECVD System Radio Frequency Plasma-Enhanced Chemical Vapor Deposition

RF PECVD System Radio Frequency Plasma-Enhanced Chemical Vapor Deposition

RF-PECVD is an acronym for "Radio Frequency Plasma-Enhanced Chemical Vapor Deposition." It deposits DLC (Diamond-like carbon film) on germanium and silicon substrates. It is utilized in the 3-12um infrared wavelength range.

Cylindrical Resonator MPCVD Diamond Machine for lab diamond growth

Cylindrical Resonator MPCVD Diamond Machine for lab diamond growth

Learn about Cylindrical Resonator MPCVD Machine, the microwave plasma chemical vapor deposition method used for growing diamond gemstones and films in the jewelry and semi-conductor industries. Discover its cost-effective advantages over traditional HPHT methods.

Electron Beam Evaporation Graphite Crucible

Electron Beam Evaporation Graphite Crucible

A technology mainly used in the field of power electronics. It is a graphite film made of carbon source material by material deposition using electron beam technology.

Vacuum hot press furnace

Vacuum hot press furnace

Discover the advantages of Vacuum Hot Press Furnace! Manufacture dense refractory metals & compounds, ceramics, and composites under high temp and pressure.

Plasma enhanced evaporation deposition PECVD coating machine

Plasma enhanced evaporation deposition PECVD coating machine

Upgrade your coating process with PECVD coating equipment. Ideal for LED, power semiconductors, MEMS and more. Deposits high-quality solid films at low temps.

Bell-jar Resonator MPCVD Diamond Machine for lab and diamond growth

Bell-jar Resonator MPCVD Diamond Machine for lab and diamond growth

Get high-quality diamond films with our Bell-jar Resonator MPCVD machine designed for lab and diamond growth. Discover how Microwave Plasma Chemical Vapor Deposition works for growing diamonds using carbon gas and plasma.

Graphite evaporation crucible

Graphite evaporation crucible

Vessels for high temperature applications, where materials are kept at extremely high temperatures to evaporate, allowing thin films to be deposited on substrates.

CVD Diamond coating

CVD Diamond coating

CVD Diamond Coating: Superior Thermal Conductivity, Crystal Quality, and Adhesion for Cutting Tools, Friction, and Acoustic Applications

915MHz MPCVD Diamond Machine

915MHz MPCVD Diamond Machine

915MHz MPCVD Diamond Machine and its multi-crystal effective growth, the maximum area can reach 8 inches, the maximum effective growth area of single crystal can reach 5 inches. This equipment is mainly used for the production of large-size polycrystalline diamond films, the growth of long single crystal diamonds, the low-temperature growth of high-quality graphene, and other materials that require energy provided by microwave plasma for growth.

CVD diamond for thermal management

CVD diamond for thermal management

CVD diamond for thermal management: High-quality diamond with thermal conductivity up to 2000 W/mK, ideal for heat spreaders, laser diodes, and GaN on Diamond (GOD) applications.

CVD boron doped diamond

CVD boron doped diamond

CVD boron-doped diamond: A versatile material enabling tailored electrical conductivity, optical transparency, and exceptional thermal properties for applications in electronics, optics, sensing, and quantum technologies.

Customer made versatile CVD tube furnace CVD machine

Customer made versatile CVD tube furnace CVD machine

Get your exclusive CVD furnace with KT-CTF16 Customer Made Versatile Furnace. Customizable sliding, rotating, and tilting functions for precise reactions. Order now!

Inclined rotary plasma enhanced chemical deposition (PECVD) tube furnace machine

Inclined rotary plasma enhanced chemical deposition (PECVD) tube furnace machine

Introducing our inclined rotary PECVD furnace for precise thin film deposition. Enjoy automatic matching source, PID programmable temperature control, and high accuracy MFC mass flowmeter control. Built-in safety features for peace of mind.


Leave Your Message