Products Lab Consumables & Materials Lab Materials Aluminum Copper Alloy (AlCu) Sputtering Target / Powder / Wire / Block / Granule
Aluminum Copper Alloy (AlCu) Sputtering Target / Powder / Wire / Block / Granule

Lab Materials

Aluminum Copper Alloy (AlCu) Sputtering Target / Powder / Wire / Block / Granule

Item Number : LM-AlCu

Price varies based on specs and customizations


Chemical Formula
AlCu
Purity
4N
Commonly Used Ratio
Cu:Al=95:5 at% / Cu:Al=84:16 at%
Shape
discs / wire / block / powder / plates / column targets / step target / custom-made
ISO & CE icon

Shipping:

Contact us to get shipping details Enjoy On-time Dispatch Guarantee.

We provide Aluminum Copper Alloy (AlCu) materials tailored to your laboratory needs, at competitive prices. Our specialization is in manufacturing and customizing AlCu materials with varying purities, shapes, and sizes to cater to your specific demands.

Our diverse product range includes sputtering targets (circular, square, tubular, irregular), coating materials, cylinders, cones, particles, foils, powders, 3D printing powders, nanometer powders, wire rods, ingots, and blocks, available in different specifications and sizes.

Details

Aluminum Copper Alloy (AlCu) Sputtering Target
Aluminum Copper Alloy (AlCu) Sputtering Target
Aluminum Copper Alloy (AlCu) Sputtering Target
Aluminum Copper Alloy (AlCu) Sputtering Target
Aluminum Copper Alloy (AlCu) Sputtering Target
Aluminum Copper Alloy (AlCu) Sputtering Target
Aluminum Copper Alloy (AlCu) Sputtering Target
Aluminum Copper Alloy (AlCu) Sputtering Target
Aluminum Copper Alloy (AlCu) Sputtering Target
Aluminum Copper Alloy (AlCu) Sputtering Target

About Aluminum Copper Alloy (AlCu)

Aluminum Copperinclude bars, ingots, ribbons, wires, shots, sheets, and foils, catering to different industrial needs.

Moreover, high purity and ultra-high purity forms of Aluminum Copper, such as metal powders, submicron powders, and nanoscale powders, are also available for specialized applications. These forms of Aluminum Copper are suitable for use in thin film deposition, chemical vapor deposition (CVD), and physical vapor deposition (PVD) applications.

Ingredient Quality Control

Raw material composition analysis
Through the use of equipment such as ICP and GDMS, the content of metal impurities is detected and analyzed to ensure that it meets the purity standard;

Non-metallic impurities are detected by equipment such as carbon and sulfur analyzers, nitrogen and oxygen analyzers.
Metallographic flaw detection analysis
The target material is inspected using flaw detection equipment to ensure that there are no defects or shrinkage holes inside the product;

Through metallographic testing, the internal grain structure of the target material is analyzed to ensure that the grains are fine and dense.
Appearance and dimension inspection
Product dimensions are measured using micrometers and precision calipers to ensure compliance with drawings;

The surface finish and cleanliness of the product are measured using a surface cleanliness meter.

Conventional Sputtering Target Sizes

Preparation process
hot isostatic pressing, vacuum melting, etc.
Sputtering target shape
plane sputtering target, multi-arc sputtering target, step sputtering target, special-shaped sputtering target
Round sputtering target size
Diameter: 25.4mm / 50mm / 50.8mm / 60mm / 76.2mm / 80mm / 100mm / 101.6mm / 152.4mm
Thickness: 3mm / 4mm / 5mm / 6mm / 6.35mm
Size can be customized.
Square sputtering target size
50×50×3mm / 100×100×4mm / 300×300×5mm, size can be customized

Available Metal Forms

Metal Forms Details

We manufacture almost all the metals listed on the periodic table in a wide range of forms and purities, as well as standard sizes and dimensions. We can also produce custom-made products to meet specific customer requirements, such as size, shape, surface area, composition, and more. The following list provides a sample of the forms we offer, but it is not exhaustive. If you need laboratory consumables, please contact us directly to request a quote.

  • Flat/Planar Forms: Board, Film, Foil, Microfoil, Microleaf, Paper, Plate, Ribbon, Sheet, Strip, Tape, Wafer
  • Preformed Shapes: Anodes, Balls, Bands, Bars, Boats, Bolts, Briquettes, Cathodes, Circles, Coils, Crucibles, Crystals, Cubes, Cups, Cylinders, Discs, Electrodes, Fibers, Filaments, Flanges, Grids, Lenses, Mandrels, Nuts, Parts, Prisms, Pucks, Rings, Rods, Shapes, Shields, Sleeves, Springs, Squares, Sputtering Targets, Sticks, Tubes, Washers, Windows, Wires
  • Microsizes: Beads, Bits, Capsules, Chips, Coins, Dust, Flakes, Grains, Granules, Micropowder, Needles, Particles, Pebbles, Pellets, Pins, Pills, Powder, Shavings, Shot, Slugs, Spheres, Tablets
  • Macrosizes: Billets, Chunks, Cuttings, Fragments, Ingots, Lumps, Nuggets, Pieces, Punchings, Rocks, Scraps, Segments, Turnings
  • Porous and Semi-Porous: Fabric, Foam, Gauze, Honeycomb, Mesh, Sponge, Wool
  • Nanoscale: Nanoparticles, Nanopowders, Nanofoils, Nanotubes, Nanorods, Nanoprisms
  • Others: Concentrate, Ink, Paste, Precipitate, Residue, Samples, Specimens

KinTek specializes in the manufacturing of high-purity and ultra-high-purity materials with a purity range of 99.999% (5N), 99.9999% (6N), 99.99995% (6N5), and in some cases, up to 99.99999% (7N). Our materials are available in specific grades, including UP/UHP, semiconductor, electronic, deposition, fiber optic, and MBE grades. Our high-purity metals, oxides, and compounds are specifically crafted to meet the rigorous demands of high-technology applications and are ideal for use as dopants and precursor materials for thin film deposition, crystal growth of semiconductors, and synthesis of nanomaterials. These materials find use in advanced microelectronics, solar cells, fuel cells, optical materials, and other cutting-edge applications.

Packaging

We use vacuum packaging for our high-purity materials, and each material has specific packaging tailored to its unique characteristics. For instance, our Hf sputter target is externally tagged and labeled to facilitate efficient identification and quality control. We take great care to prevent any damage that could occur during storage or transportation.

FAQ

What is sputtering target?

A sputtering target is a material used in the process of sputter deposition, which involves breaking up the target material into tiny particles that form a spray and coat a substrate, such as a silicon wafer. Sputtering targets are typically metallic elements or alloys, although some ceramic targets are available. They come in a variety of sizes and shapes, with some manufacturers creating segmented targets for larger sputtering equipment. Sputtering targets have a wide range of applications in fields such as microelectronics, thin film solar cells, optoelectronics, and decorative coatings due to their ability to deposit thin films with high precision and uniformity.

How are sputtering targets made?

Sputtering targets are made using a variety of manufacturing processes depending on the properties of the target material and its application. These include vacuum melting and rolling, hot-pressed, special press-sintered process, vacuum hot-pressed, and forged methods. Most sputtering target materials can be fabricated into a wide range of shapes and sizes, with circular or rectangular shapes being the most common. Targets are usually made from metallic elements or alloys, but ceramic targets can also be used. Compound sputtering targets are also available, made from a variety of compounds including oxides, nitrides, borides, sulphides, selenides, tellurides, carbides, crystalline, and composite mixtures.

What is sputtering target used for?

Sputtering targets are used in a process called sputtering to deposit thin films of a material onto a substrate using ions to bombard the target. These targets have a wide range of applications in various fields, including microelectronics, thin film solar cells, optoelectronics, and decorative coatings. They allow for the deposition of thin films of materials onto a variety of substrates with high precision and uniformity, making them an ideal tool for producing precision products. Sputtering targets come in various shapes and sizes and can be specialized to meet the specific requirements of the application.

What are sputtering targets for electronics?

Sputtering targets for electronics are thin discs or sheets of materials such as aluminum, copper, and titanium that are used to deposit thin films onto silicon wafers to create electronic devices like transistors, diodes, and integrated circuits. These targets are used in a process called sputtering, in which atoms of the target material are physically ejected from the surface and deposited onto a substrate by bombarding the target with ions. Sputtering targets for electronics are essential in the production of microelectronics and typically require high precision and uniformity to ensure quality devices.

What is the lifetime of a sputtering target?

The lifetime of a sputtering target depends on factors such as the material composition, purity, and the specific application it is being used for. Generally, targets can last for several hundred to a few thousand hours of sputtering, but this can vary widely depending on the specific conditions of each run. Proper handling and maintenance can also extend the lifetime of a target. In addition, the use of rotary sputtering targets can increase runtimes and reduce the occurrence of defects, making them a more cost-effective option for high volume processes.
View more faqs for this product

4.8

out of

5

Outstanding quality, fast shipping, and great customer service.

Gerald C. Pearson - United States

4.9

out of

5

Highly satisfied with the product, exceeded my expectations. Will definitely purchase again.

Arthur J. Hutchinson - Spain

4.9

out of

5

Excellent value for money, top-notch quality. Highly recommend this product.

William D. Richards - Canada

4.7

out of

5

Very happy with the product, works flawlessly. Shipping was prompt and efficient.

Roy E. Culver - Australia

4.8

out of

5

Great product, very durable and long-lasting. Highly recommend it to others.

Rodney C. Porter - United Kingdom

4.7

out of

5

Amazing product, exceeded my expectations. Shipping was fast and hassle-free.

Daniel J. Roberts - Germany

4.6

out of

5

Excellent quality, works perfectly. Very satisfied with my purchase.

Ronald F. Edwards - France

4.9

out of

5

Outstanding product, very satisfied with the performance. Fast delivery and great customer service.

Joseph S. Harris - Japan

4.8

out of

5

Excellent value for money, exceeded my expectations. Will definitely recommend to others.

David E. Thompson - India

4.9

out of

5

Very happy with the product, works like a charm. Shipping was fast and efficient.

Benjamin G. Wright - China

4.7

out of

5

Amazing product, very durable and long-lasting. Highly recommend it to others.

Josephine A. Brown - Brazil

4.8

out of

5

Excellent quality, works perfectly. Very satisfied with my purchase.

Jessica M. Garcia - Italy

4.6

out of

5

Outstanding product, very satisfied with the performance. Fast delivery and great customer service.

Elizabeth K. Smith - Russia

4.9

out of

5

Excellent value for money, exceeded my expectations. Will definitely recommend to others.

Sarah J. Johnson - South Korea

4.8

out of

5

Very happy with the product, works like a charm. Shipping was fast and efficient.

Thomas L. Wilson - Mexico

4.9

out of

5

Amazing product, very durable and long-lasting. Highly recommend it to others.

Anthony C. Martinez - Turkey

4.7

out of

5

Excellent quality, works perfectly. Very satisfied with my purchase.

Christopher B. Miller - Indonesia

4.8

out of

5

Outstanding product, very satisfied with the performance. Fast delivery and great customer service.

Samuel A. Taylor - Netherlands

PDF - Aluminum Copper Alloy (AlCu) Sputtering Target / Powder / Wire / Block / Granule

Download

Catalog of Lab Materials

Download

Catalog of Sputtering Targets

Download

REQUEST A QUOTE

Our professional team will reply to you within one business day. Please feel free to contact us!

Related Products

High Purity Aluminum (Al) Sputtering Target / Powder / Wire / Block / Granule

High Purity Aluminum (Al) Sputtering Target / Powder / Wire / Block / Granule

Get high-quality Aluminum (Al) materials for laboratory use at affordable prices. We offer customized solutions including sputtering targets, powders, foils, ingots & more to meet your unique needs. Order now!

Nickel Aluminum Alloy (NiAl) Sputtering Target / Powder / Wire / Block / Granule

Nickel Aluminum Alloy (NiAl) Sputtering Target / Powder / Wire / Block / Granule

Looking for high-quality Nickel Aluminum Alloy materials for your lab? Our experts produce and customize NiAl materials to suit your specific needs. Find a wide range of sizes and specifications for sputtering targets, coating materials, and more at affordable prices.

Copper Nickel Alloy (CuNi) Sputtering Target / Powder / Wire / Block / Granule

Copper Nickel Alloy (CuNi) Sputtering Target / Powder / Wire / Block / Granule

Get high-quality Copper Nickel Alloy (CuNi) materials at affordable prices for your laboratory needs. Our customized offerings include sputtering targets, coatings, powders, and more. Order now!

PTFE container

PTFE container

PTFE container is a container with excellent corrosion resistance and chemical inertness.

Copper Zirconium Alloy (CuZr) Sputtering Target / Powder / Wire / Block / Granule

Copper Zirconium Alloy (CuZr) Sputtering Target / Powder / Wire / Block / Granule

Discover our range of Copper Zirconium Alloy materials at affordable prices, tailored to your unique requirements. Browse our selection of sputtering targets, coatings, powders, and more.

Carbon paper/cloth Diaphragm Copper/aluminum foil and other professional cutting tools

Carbon paper/cloth Diaphragm Copper/aluminum foil and other professional cutting tools

Professional tools for cutting lithium sheets, carbon paper, carbon cloth, separators, copper foil, aluminum foil, etc., with round and square shapes and different sizes of blades.

High Purity Aluminum Oxide (Al2O3) Sputtering Target / Powder / Wire / Block / Granule

High Purity Aluminum Oxide (Al2O3) Sputtering Target / Powder / Wire / Block / Granule

Looking for Aluminum Oxide materials for your lab? We offer high-quality Al2O3 products at affordable prices with customizable shapes and sizes to meet your specific needs. Find sputtering targets, coating materials, powders, and more.

Square Lab Press Mold

Square Lab Press Mold

Create uniform samples easily with Square Lab Press Mold - available in various sizes. Ideal for battery, cement, ceramics, and more. Custom sizes available.

Copper Nickel Indium Alloy (CuNiIn) Sputtering Target / Powder / Wire / Block / Granule

Copper Nickel Indium Alloy (CuNiIn) Sputtering Target / Powder / Wire / Block / Granule

Looking for Copper Nickel Indium materials for your lab? Our affordable products come in different purities, shapes, and sizes to fit your needs. Browse our sputtering targets, powders, foils, and more!

Lithium Aluminum Alloy (AlLi) Sputtering Target / Powder / Wire / Block / Granule

Lithium Aluminum Alloy (AlLi) Sputtering Target / Powder / Wire / Block / Granule

Looking for Lithium Aluminum Alloy materials for your lab? Our expertly produced and tailored AlLi materials come in various purities, shapes, and sizes, including sputtering targets, coatings, powders, and more. Get reasonable prices and unique solutions today.

Silicon Carbide (SIC) Ceramic Plate

Silicon Carbide (SIC) Ceramic Plate

Silicon nitride (sic) ceramic is an inorganic material ceramic that does not shrink during sintering. It is a high-strength, low-density, high-temperature-resistant covalent bond compound.

Zirconia Ceramic Rod - Stabilized Yttrium Precision Machining

Zirconia Ceramic Rod - Stabilized Yttrium Precision Machining

Zirconia ceramic rods are prepared by isostatic pressing, and a uniform, dense and smooth ceramic layer and transition layer are formed at high temperature and high speed.

Alumina (Al2O3) Furnace Tube - High Temperature

Alumina (Al2O3) Furnace Tube - High Temperature

High temperature alumina furnace tube combines the advantages of high hardness of alumina, good chemical inertness and steel, and has excellent wear resistance, thermal shock resistance and mechanical shock resistance.

Aluminum Nitride (AlN) Sputtering Target / Powder / Wire / Block / Granule

Aluminum Nitride (AlN) Sputtering Target / Powder / Wire / Block / Granule

High-quality Aluminum Nitride (AlN) materials in various shapes and sizes for laboratory use at affordable prices. Explore our range of sputtering targets, coatings, powders, and more. Customized solutions available.

Cylindrical press mold

Cylindrical press mold

Efficiently form and test most samples with Cylindrical Press Molds in a range of sizes. Made of Japanese high-speed steel, with long service life and customizable sizes.

Manganese Cobalt Nickel alloy (MnCoNi) Sputtering Target / Powder / Wire / Block / Granule

Manganese Cobalt Nickel alloy (MnCoNi) Sputtering Target / Powder / Wire / Block / Granule

Get top-quality Manganese Cobalt Nickel alloy materials for your laboratory needs at affordable prices. Our customized products come in various sizes and shapes, including sputtering targets, coating materials, powders, and more.

Alumina (Al2O3) Ceramic Rod-Insulated

Alumina (Al2O3) Ceramic Rod-Insulated

Insulated alumina rod is a fine ceramic material. Alumina rods have excellent electrical insulating properties, high chemical resistance and low thermal expansion.

Aluminum Boride (AlB2) Sputtering Target / Powder / Wire / Block / Granule

Aluminum Boride (AlB2) Sputtering Target / Powder / Wire / Block / Granule

Looking for high-quality Aluminum Boride materials for your lab? Our custom-tailored AlB2 products come in various shapes and sizes to suit your needs. Check out our range of sputtering targets, coating materials, powders, and more.

Boron Nitride (BN) Ceramic Custom Parts

Boron Nitride (BN) Ceramic Custom Parts

Boron nitride (BN) ceramics can have different shapes, so they can be manufactured to generate high temperature, high pressure, insulation and heat dissipation to avoid neutron radiation.

Silicon Nitride (SiN) Ceramic Sheet Precision Machining Ceramic

Silicon Nitride (SiN) Ceramic Sheet Precision Machining Ceramic

Silicon nitride plate is a commonly used ceramic material in the metallurgical industry due to its uniform performance at high temperatures.

High Purity Hafnium (Hf) Sputtering Target / Powder / Wire / Block / Granule

High Purity Hafnium (Hf) Sputtering Target / Powder / Wire / Block / Granule

Get high-quality Hafnium (Hf) materials tailored to your lab needs at reasonable prices. Find various shapes and sizes for sputtering targets, coating materials, powders, and more. Order now.

Hexagonal Boron Nitride(HBN) Thermocouple Protection Tube

Hexagonal Boron Nitride(HBN) Thermocouple Protection Tube

Hexagonal boron nitride ceramics is an emerging industrial material. Because of its similar structure to graphite and many similarities in performance, it is also called "white graphite".

High Purity Cobalt (Co) Sputtering Target / Powder / Wire / Block / Granule

High Purity Cobalt (Co) Sputtering Target / Powder / Wire / Block / Granule

Get affordable Cobalt (Co) materials for laboratory use, tailored to your unique needs. Our range includes sputtering targets, powders, foils, and more. Contact us today for customized solutions!

High Purity Indium Tin Oxide (ITO) Sputtering Target / Powder / Wire / Block / Granule

High Purity Indium Tin Oxide (ITO) Sputtering Target / Powder / Wire / Block / Granule

Get high-quality Indium Tin Oxide (ITO) Sputtering Targets for your lab needs at reasonable prices. Our customized options of different shapes and sizes cater to your unique requirements. Browse our range today.

High Purity Metal Sheets - Gold / Platinum / copper / iron etc...

High Purity Metal Sheets - Gold / Platinum / copper / iron etc...

Elevate your experiments with our high-purity sheet metal. Gold, platinum, copper, iron, and more. Perfect for electrochemistry and other fields.