Lab Materials
High Purity Aluminum (Al) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-AL
Price varies based on specs and customizations
- Chemical Formula
- Al
- Purity
- 3N-6N
- Shape
- discs / wire / block / powder / plates / column targets / step target / custom-made
Shipping:
Contact us to get shipping details Enjoy On-time Dispatch Guarantee.
We provide affordable Aluminum (Al) materials for laboratory use, customized to suit your unique needs with various purities, shapes, and sizes.
Our selection includes sputtering targets, coating materials, cylinders, cones, particles, foils, powders, 3D printing powders, nanometer powders, wire rods, ingots, and blocks in a range of specifications and sizes.
Main Products
- Aluminum sputtering targets: 99.99%~99.999% purity, customizable sizes (φ25.4×4mm; φ50.8×3mm; φ76.2×5mm; φ100×3mm), used for magnetron sputtering coating, MEMS integration circuits, LED packaging, and more.
- Aluminum particles: 99.99%~99.999% purity, customizable sizes (5N 3×3mm; 4N 6×6mm), used for evaporation coating, alloy melting, iron and steel deoxidizing, and more.
- Aluminum sheets: 99.99%-99.999% purity, customizable sizes (thickness 0.01mm; 0.2mm, etc.), used for AAO anodized aluminum, coating, and more.
- Aluminum wire: 99.99%~99.999% purity, customizable sizes (φ1mm; φ3mm; φ10mm, etc.), used for evaporation coating, alloy melting, mechanical analysis, and more.
- Aluminum rods: 99.99%~99.999% purity, conventional sizes (φ12×50mm; φ15×120mm), used for scientific research experiments and more.
- Aluminum blocks: 99.9%~99.999% purity, regular size (10-30mm), used for alloy melting and more.
Details
About Aluminum (Al)
Aluminum is a widely used metal available in various forms and purities, ranging from 99% to 99.9999% (ACS grade to ultra-high purity). It is commonly used in the form of foils, sputtering targets, and nanopowders, and is also available in elemental or metallic forms such as pellets, rods, wires, and granules for evaporation source material purposes.
High-purity (99.999%) Aluminum Oxide (Al2O3) Powder is available in forms including powders and dense pellets for applications such as optical coating and thin film applications. Additionally, Aluminum is available in soluble forms including chlorides, nitrates, and acetates. These compounds can be manufactured as solutions at specified stoichiometries.
Aluminum can also be synthesized in ultra-high purity (99.999+%) forms for advanced electronic, thin film deposition using sputtering targets and evaporation materials, metallurgy, optical materials, and other high technology applications. Organometallic aluminum compounds are soluble in organic or non-aqueous solvents. Analytical services, including MS-ICP, X-Ray Diffraction, PSD, and Surface Area (BET) analysis, are available for certified chemical and physical analysis techniques.
Ingredient Quality Control
- Raw material composition analysis
- Through the use of equipment such as ICP and GDMS, the content of metal impurities is detected and analyzed to ensure that it meets the purity standard;
Non-metallic impurities are detected by equipment such as carbon and sulfur analyzers, nitrogen and oxygen analyzers. - Metallographic flaw detection analysis
- The target material is inspected using flaw detection equipment to ensure that there are no defects or shrinkage holes inside the product;
Through metallographic testing, the internal grain structure of the target material is analyzed to ensure that the grains are fine and dense. - Appearance and dimension inspection
- Product dimensions are measured using micrometers and precision calipers to ensure compliance with drawings;
The surface finish and cleanliness of the product are measured using a surface cleanliness meter.
Conventional Sputtering Target Sizes
- Preparation process
- hot isostatic pressing, vacuum melting, etc.
- Sputtering target shape
- plane sputtering target, multi-arc sputtering target, step sputtering target, special-shaped sputtering target
- Round sputtering target size
- Diameter: 25.4mm / 50mm / 50.8mm / 60mm / 76.2mm / 80mm / 100mm / 101.6mm / 152.4mm
Thickness: 3mm / 4mm / 5mm / 6mm / 6.35mm
Size can be customized. - Square sputtering target size
- 50×50×3mm / 100×100×4mm / 300×300×5mm, size can be customized
Available Metal Forms
Metal Forms Details
We manufacture almost all the metals listed on the periodic table in a wide range of forms and purities, as well as standard sizes and dimensions. We can also produce custom-made products to meet specific customer requirements, such as size, shape, surface area, composition, and more. The following list provides a sample of the forms we offer, but it is not exhaustive. If you need laboratory consumables, please contact us directly to request a quote.
- Flat/Planar Forms: Board, Film, Foil, Microfoil, Microleaf, Paper, Plate, Ribbon, Sheet, Strip, Tape, Wafer
- Preformed Shapes: Anodes, Balls, Bands, Bars, Boats, Bolts, Briquettes, Cathodes, Circles, Coils, Crucibles, Crystals, Cubes, Cups, Cylinders, Discs, Electrodes, Fibers, Filaments, Flanges, Grids, Lenses, Mandrels, Nuts, Parts, Prisms, Pucks, Rings, Rods, Shapes, Shields, Sleeves, Springs, Squares, Sputtering Targets, Sticks, Tubes, Washers, Windows, Wires
- Microsizes: Beads, Bits, Capsules, Chips, Coins, Dust, Flakes, Grains, Granules, Micropowder, Needles, Particles, Pebbles, Pellets, Pins, Pills, Powder, Shavings, Shot, Slugs, Spheres, Tablets
- Macrosizes: Billets, Chunks, Cuttings, Fragments, Ingots, Lumps, Nuggets, Pieces, Punchings, Rocks, Scraps, Segments, Turnings
- Porous and Semi-Porous: Fabric, Foam, Gauze, Honeycomb, Mesh, Sponge, Wool
- Nanoscale: Nanoparticles, Nanopowders, Nanofoils, Nanotubes, Nanorods, Nanoprisms
- Others: Concentrate, Ink, Paste, Precipitate, Residue, Samples, Specimens
KinTek specializes in the manufacturing of high-purity and ultra-high-purity materials with a purity range of 99.999% (5N), 99.9999% (6N), 99.99995% (6N5), and in some cases, up to 99.99999% (7N). Our materials are available in specific grades, including UP/UHP, semiconductor, electronic, deposition, fiber optic, and MBE grades. Our high-purity metals, oxides, and compounds are specifically crafted to meet the rigorous demands of high-technology applications and are ideal for use as dopants and precursor materials for thin film deposition, crystal growth of semiconductors, and synthesis of nanomaterials. These materials find use in advanced microelectronics, solar cells, fuel cells, optical materials, and other cutting-edge applications.
Packaging
We use vacuum packaging for our high-purity materials, and each material has specific packaging tailored to its unique characteristics. For instance, our Hf sputter target is externally tagged and labeled to facilitate efficient identification and quality control. We take great care to prevent any damage that could occur during storage or transportation.
FAQ
What is sputtering target?
What are high purity metals?
What are high purity materials?
How are sputtering targets made?
What are high purity metals used for?
What is sputtering target used for?
What are the benefits of using high-purity metals?
What are sputtering targets for electronics?
Which industries commonly use high-purity metals?
What is the lifetime of a sputtering target?
4.8
out of
5
Excellent quality and purity, very cost-effective.
4.9
out of
5
Amazing product, met all our research requirements.
4.7
out of
5
Very satisfied with the quick delivery and top-notch quality.
4.8
out of
5
Great value for money, will definitely order again.
5.0
out of
5
Highly recommend, exceeded my expectations.
4.9
out of
5
Very impressed with the durability and performance.
4.7
out of
5
The purity of the aluminum is exceptional.
4.8
out of
5
State-of-the-art technology, highly satisfied.
5.0
out of
5
Unmatched quality, worth every penny.
4.9
out of
5
Reliable and consistent, highly recommend.
REQUEST A QUOTE
Our professional team will reply to you within one business day. Please feel free to contact us!
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