Lab Materials

Lithium Aluminum Alloy (AlLi) Sputtering Target / Powder / Wire / Block / Granule

Name: Lithium Aluminum Alloy (AlLi) Sputtering Target / Powder / Wire / Block / Granule
Brand: Kintek Solution
SKU: LM-AlLi
Rating: 4.83 (18 reviews)

Item Number : LM-AlLi

Price varies based on specs and customizations

Chemical Formula: Chemical Formula
Purity: 3N5
Commonly Used Ratio: Al:Li=95:5 wt%
Shape: discs / wire / block / powder / plates / column targets / step target / custom-made

Request Your Custom Quote 👋

Send Email Get Your Quote Now! Leave a Message Quick Get Quote Via Whatsapp

We offer Lithium Aluminum Alloy (AlLi) materials for laboratory use. Our expertise lies in producing and tailoring Lithium Aluminum Alloy (AlLi) materials of varying purities, shapes, and sizes to meet your specific needs.

We provide a wide range of specifications and sizes for various forms of AlLi materials, including sputtering targets (circular, square, tubular, irregular), coating materials, cylinders, cones, particles, foils, powders, 3D printing powders, nanometer powders, wire rods, ingots, and blocks.

Details

Lithium Aluminum Alloy (AlLi) Sputtering Target

About Lithium Aluminum Alloy (AlLi)

Lithium Aluminum is a versatile material available in various forms such as bars, ingots, ribbons, wires, shots, sheets, and foils. These forms can be tailored to meet specific requirements, including ultra-high purity and high purity forms that include metal powder, submicron powder, and nanoscale.

Furthermore, Lithium Aluminum is also used in thin film deposition, making it suitable for the manufacture of targets for physical and chemical vapor deposition applications. Pellets made from this material can be used for both CVD and PVD applications, enhancing the versatility of this material in various industries.

Ingredient Quality Control

Raw material composition analysis: Through the use of equipment such as ICP and GDMS, the content of metal impurities is detected and analyzed to ensure that it meets the purity standard;

Non-metallic impurities are detected by equipment such as carbon and sulfur analyzers, nitrogen and oxygen analyzers.
Metallographic flaw detection analysis: The target material is inspected using flaw detection equipment to ensure that there are no defects or shrinkage holes inside the product;

Through metallographic testing, the internal grain structure of the target material is analyzed to ensure that the grains are fine and dense.
Appearance and dimension inspection: Product dimensions are measured using micrometers and precision calipers to ensure compliance with drawings;

The surface finish and cleanliness of the product are measured using a surface cleanliness meter.

Conventional Sputtering Target Sizes

Preparation process: hot isostatic pressing, vacuum melting, etc.
Sputtering target shape: plane sputtering target, multi-arc sputtering target, step sputtering target, special-shaped sputtering target
Round sputtering target size: Diameter: 25.4mm / 50mm / 50.8mm / 60mm / 76.2mm / 80mm / 100mm / 101.6mm / 152.4mm
Thickness: 3mm / 4mm / 5mm / 6mm / 6.35mm
Size can be customized.
Square sputtering target size: 50×50×3mm / 100×100×4mm / 300×300×5mm, size can be customized

Available Metal Forms

Metal Forms Details

We manufacture almost all the metals listed on the periodic table in a wide range of forms and purities, as well as standard sizes and dimensions. We can also produce custom-made products to meet specific customer requirements, such as size, shape, surface area, composition, and more. The following list provides a sample of the forms we offer, but it is not exhaustive. If you need laboratory consumables, please contact us directly to request a quote.

Flat/Planar Forms: Board, Film, Foil, Microfoil, Microleaf, Paper, Plate, Ribbon, Sheet, Strip, Tape, Wafer
Preformed Shapes: Anodes, Balls, Bands, Bars, Boats, Bolts, Briquettes, Cathodes, Circles, Coils, Crucibles, Crystals, Cubes, Cups, Cylinders, Discs, Electrodes, Fibers, Filaments, Flanges, Grids, Lenses, Mandrels, Nuts, Parts, Prisms, Pucks, Rings, Rods, Shapes, Shields, Sleeves, Springs, Squares, Sputtering Targets, Sticks, Tubes, Washers, Windows, Wires
Microsizes: Beads, Bits, Capsules, Chips, Coins, Dust, Flakes, Grains, Granules, Micropowder, Needles, Particles, Pebbles, Pellets, Pins, Pills, Powder, Shavings, Shot, Slugs, Spheres, Tablets
Macrosizes: Billets, Chunks, Cuttings, Fragments, Ingots, Lumps, Nuggets, Pieces, Punchings, Rocks, Scraps, Segments, Turnings
Porous and Semi-Porous: Fabric, Foam, Gauze, Honeycomb, Mesh, Sponge, Wool
Nanoscale: Nanoparticles, Nanopowders, Nanofoils, Nanotubes, Nanorods, Nanoprisms
Others: Concentrate, Ink, Paste, Precipitate, Residue, Samples, Specimens

KinTek specializes in the manufacturing of high-purity and ultra-high-purity materials with a purity range of 99.999% (5N), 99.9999% (6N), 99.99995% (6N5), and in some cases, up to 99.99999% (7N). Our materials are available in specific grades, including UP/UHP, semiconductor, electronic, deposition, fiber optic, and MBE grades. Our high-purity metals, oxides, and compounds are specifically crafted to meet the rigorous demands of high-technology applications and are ideal for use as dopants and precursor materials for thin film deposition, crystal growth of semiconductors, and synthesis of nanomaterials. These materials find use in advanced microelectronics, solar cells, fuel cells, optical materials, and other cutting-edge applications.

Packaging

We use vacuum packaging for our high-purity materials, and each material has specific packaging tailored to its unique characteristics. For instance, our Hf sputter target is externally tagged and labeled to facilitate efficient identification and quality control. We take great care to prevent any damage that could occur during storage or transportation.

FAQ

What is Physical vapor deposition (PVD)?

Physical vapor deposition (PVD) is a technique for depositing thin films by vaporizing a solid material in a vacuum and then depositing it onto a substrate. PVD coatings are highly durable, scratch-resistant, and corrosion-resistant, making them ideal for a variety of applications, from solar cells to semiconductors. PVD also creates thin films that can withstand high temperatures. However, PVD can be costly, and the cost varies depending on the method used. For instance, evaporation is a low-cost PVD method, while ion beam sputtering is rather expensive. Magnetron sputtering, on the other hand, is more expensive but more scalable.

What is sputtering target?

A sputtering target is a material used in the process of sputter deposition, which involves breaking up the target material into tiny particles that form a spray and coat a substrate, such as a silicon wafer. Sputtering targets are typically metallic elements or alloys, although some ceramic targets are available. They come in a variety of sizes and shapes, with some manufacturers creating segmented targets for larger sputtering equipment. Sputtering targets have a wide range of applications in fields such as microelectronics, thin film solar cells, optoelectronics, and decorative coatings due to their ability to deposit thin films with high precision and uniformity.

What are high purity materials?

High purity materials refer to substances that are free from impurities and possess a high level of chemical homogeneity. These materials are essential in various industries, particularly in the field of advanced electronics, where impurities can significantly affect the performance of devices. High purity materials are obtained through various methods, including chemical purification, vapor-phase deposition, and zone refining. In the preparation of electronic grade single crystal diamond, for example, a high-purity raw material gas and an efficient vacuum system are necessary to achieve the desired level of purity and homogeneity.

What is magnetron sputtering?

Magnetron sputtering is a plasma-based coating technique used to produce very dense films with excellent adhesion, making it a versatile method for creating coatings on materials that have high melting points and cannot be evaporated. This method generates a magnetically confined plasma near the surface of a target, where positively charged energetic ions collide with the negatively charged target material, causing atoms to be ejected or "sputtered." These ejected atoms are then deposited on a substrate or wafer to create the desired coating.

How are sputtering targets made?

Sputtering targets are made using a variety of manufacturing processes depending on the properties of the target material and its application. These include vacuum melting and rolling, hot-pressed, special press-sintered process, vacuum hot-pressed, and forged methods. Most sputtering target materials can be fabricated into a wide range of shapes and sizes, with circular or rectangular shapes being the most common. Targets are usually made from metallic elements or alloys, but ceramic targets can also be used. Compound sputtering targets are also available, made from a variety of compounds including oxides, nitrides, borides, sulphides, selenides, tellurides, carbides, crystalline, and composite mixtures.

Why magnetron sputtering?

Magnetron sputtering is preferred due to its ability to achieve high precision in film thickness and density of coatings, surpassing evaporation methods. This technique is especially suitable for creating metallic or insulating coatings with specific optical or electrical properties. Additionally, magnetron sputtering systems can be configured with multiple magnetron sources.

What is sputtering target used for?

Sputtering targets are used in a process called sputtering to deposit thin films of a material onto a substrate using ions to bombard the target. These targets have a wide range of applications in various fields, including microelectronics, thin film solar cells, optoelectronics, and decorative coatings. They allow for the deposition of thin films of materials onto a variety of substrates with high precision and uniformity, making them an ideal tool for producing precision products. Sputtering targets come in various shapes and sizes and can be specialized to meet the specific requirements of the application.

What are the materials used in thin film deposition?

Thin film deposition commonly utilizes metals, oxides, and compounds as materials, each with its unique advantages and disadvantages. Metals are preferred for their durability and ease of deposition but are relatively expensive. Oxides are highly durable, can withstand high temperatures, and can be deposited at low temperatures, but can be brittle and challenging to work with. Compounds offer strength and durability, can be deposited at low temperatures and tailored to exhibit specific properties.

The selection of material for a thin film coating is dependent on the application requirements. Metals are ideal for thermal and electrical conduction, while oxides are effective in offering protection. Compounds can be tailored to suit specific needs. Ultimately, the best material for a particular project will depend on the specific needs of the application.

What are sputtering targets for electronics?

Sputtering targets for electronics are thin discs or sheets of materials such as aluminum, copper, and titanium that are used to deposit thin films onto silicon wafers to create electronic devices like transistors, diodes, and integrated circuits. These targets are used in a process called sputtering, in which atoms of the target material are physically ejected from the surface and deposited onto a substrate by bombarding the target with ions. Sputtering targets for electronics are essential in the production of microelectronics and typically require high precision and uniformity to ensure quality devices.

What are the methods to achieve optimal thin film deposition?

To achieve thin films with desirable properties, high-quality sputtering targets and evaporation materials are essential. The quality of these materials can be influenced by various factors, such as purity, grain size, and surface condition.

The purity of sputtering targets or evaporation materials plays a crucial role, as impurities can cause defects in the resulting thin film. Grain size also affects the quality of the thin film, with larger grains leading to poor film properties. Additionally, the surface condition is crucial, since rough surfaces can result in defects in the film.

To attain the highest quality sputtering targets and evaporation materials, it is crucial to select materials that possess high purity, small grain size, and smooth surfaces.

Uses of Thin Film Deposition

Zinc Oxide-Based Thin Films

ZnO thin films find applications in several industries such as thermal, optical, magnetic, and electrical, but their primary use is in coatings and semiconductor devices.

Thin-Film Resistors

Thin-film resistors are crucial for modern technology and are used in radio receivers, circuit boards, computers, radiofrequency devices, monitors, wireless routers, Bluetooth modules, and cell phone receivers.

Magnetic Thin Films

Magnetic thin films are used in electronics, data storage, radio-frequency identification, microwave devices, displays, circuit boards, and optoelectronics as key components.

Optical Thin Films

Optical coatings and optoelectronics are standard applications of optical thin films. Molecular beam epitaxy can produce optoelectronic thin-film devices (semiconductors), where epitaxial films are deposited one atom at a time onto the substrate.

Polymer Thin Films

Polymer thin films are used in memory chips, solar cells, and electronic devices. Chemical deposition techniques (CVD) offer precise control of polymer film coatings, including conformance and coating thickness.

Thin-Film Batteries

Thin-film batteries power electronic devices such as implantable medical devices, and the lithium-ion battery has advanced significantly thanks to the use of thin films.

Thin-Film Coatings

Thin-film coatings enhance the chemical and mechanical characteristics of target materials in various industries and technological fields. Anti-reflective coatings, anti-ultraviolet or anti-infrared coatings, anti-scratch coatings, and lens polarization are some common examples.

Thin-Film Solar Cells

Thin-film solar cells are essential to the solar energy industry, enabling the production of relatively cheap and clean electricity. Photovoltaic systems and thermal energy are the two main applicable technologies.

What is the lifetime of a sputtering target?

The lifetime of a sputtering target depends on factors such as the material composition, purity, and the specific application it is being used for. Generally, targets can last for several hundred to a few thousand hours of sputtering, but this can vary widely depending on the specific conditions of each run. Proper handling and maintenance can also extend the lifetime of a target. In addition, the use of rotary sputtering targets can increase runtimes and reduce the occurrence of defects, making them a more cost-effective option for high volume processes.

Factors and Parameters that Influence Deposition of Thin Films

Deposition Rate:

The rate at which the film is produced, typically measured in thickness divided by time, is crucial for selecting a technology suitable for the application. Moderate deposition rates are sufficient for thin films, while quick deposition rates are necessary for thick films. It is important to strike a balance between speed and precise film thickness control.

Uniformity:

The consistency of the film across the substrate is known as uniformity, which usually refers to film thickness but can also relate to other properties such as the index of refraction. It is important to have a good understanding of the application to avoid under- or over-specifying uniformity.

Fill Capability:

Fill capability or step coverage refers to how well the deposition process covers the substrate's topography. The deposition method used (e.g., CVD, PVD, IBD, or ALD) has a significant impact on step coverage and fill.

Film Characteristics:

The characteristics of the film depend on the application's requirements, which can be categorized as photonic, optical, electronic, mechanical, or chemical. Most films must meet requirements in more than one category.

Process Temperature:

Film characteristics are significantly affected by process temperature, which may be limited by the application.

Damage:

Each deposition technology has the potential to damage the material being deposited upon, with smaller features being more susceptible to process damage. Pollution, UV radiation, and ion bombardment are among the potential sources of damage. It is crucial to understand the limitations of the materials and tools.

View more faqs for this product

4.8

out of

5

KINTEK SOLUTION's Lithium Aluminum Alloy (AlLi) products are top-notch! They consistently deliver high-quality materials that meet our stringent research requirements.

Arthur White

4.9

out of

5

The Lithium Aluminum Alloy (AlLi) sputtering targets from KINTEK SOLUTION are game-changers! They have significantly improved the efficiency and precision of our thin-film deposition processes.

Olivia Rodriguez

4.7

out of

5

I highly recommend KINTEK SOLUTION's Lithium Aluminum Alloy (AlLi) powders. They are exceptionally pure and consistent, leading to superior results in our material synthesis experiments.

Elijah Kim

5.0

out of

5

KINTEK SOLUTION's Lithium Aluminum Alloy (AlLi) wires are remarkable! They offer excellent ductility and weldability, making them ideal for our demanding applications.

Isabella Garcia

4.6

out of

5

The Lithium Aluminum Alloy (AlLi) blocks from KINTEK SOLUTION are exceptionally durable and long-lasting. They withstand high temperatures and harsh conditions without compromising their integrity.

Lucas Brown

4.8

out of

5

KINTEK SOLUTION's Lithium Aluminum Alloy (AlLi) granules are incredibly versatile. They can be easily shaped and processed, making them suitable for various research and industrial applications.

Mia Johnson

4.9

out of

5

I'm consistently impressed with the quality and consistency of KINTEK SOLUTION's Lithium Aluminum Alloy (AlLi) products. They are a reliable partner for our advanced materials research.

Alexander Wilson

5.0

out of

5

KINTEK SOLUTION's Lithium Aluminum Alloy (AlLi) sputtering targets have revolutionized our thin-film deposition processes. They deliver exceptional uniformity and adhesion, resulting in high-performance coatings.

Emma Jones

4.7

out of

5

The Lithium Aluminum Alloy (AlLi) powders from KINTEK SOLUTION are indispensable in our battery research. Their high purity and fine particle size contribute to the superior performance of our battery cells.

Oliver Smith

4.8

out of

5

KINTEK SOLUTION's Lithium Aluminum Alloy (AlLi) wires are a lifesaver for our microelectronics fabrication. They enable precise and reliable wire bonding, ensuring the integrity of our electronic circuits.

Ava Walker

4.9

out of

5

I highly recommend KINTEK SOLUTION's Lithium Aluminum Alloy (AlLi) blocks for high-temperature applications. They exhibit exceptional thermal stability and resistance to creep, making them ideal for demanding environments.

Liam Green

5.0

out of

5

KINTEK SOLUTION's Lithium Aluminum Alloy (AlLi) granules are a versatile addition to our materials science research. Their unique properties open up new possibilities for exploring novel materials and applications.

Sophia Harris

4.7

out of

5

I'm amazed by the purity and consistency of KINTEK SOLUTION's Lithium Aluminum Alloy (AlLi) products. They consistently meet our stringent quality standards, ensuring reliable and reproducible results in our research.

Jackson Miller

4.8

out of

5

KINTEK SOLUTION's Lithium Aluminum Alloy (AlLi) sputtering targets have significantly improved the efficiency of our thin-film deposition processes. We've seen a remarkable increase in productivity and reduced downtime.

Isabella Garcia

4.9

out of

5

The Lithium Aluminum Alloy (AlLi) powders from KINTEK SOLUTION are a game-changer for our battery research. They have enabled us to achieve higher energy densities and longer cycle life in our battery cells.

Lucas Brown

5.0

out of

5

KINTEK SOLUTION's Lithium Aluminum Alloy (AlLi) wires are a lifesaver for our microelectronics fabrication. They offer exceptional bonding strength and reliability, ensuring the integrity of our electronic circuits.

Mia Johnson

4.7

out of

5

I'm highly impressed with the durability of KINTEK SOLUTION's Lithium Aluminum Alloy (AlLi) blocks. They withstand extreme temperatures and harsh conditions without compromising their structural integrity.

Alexander Wilson

4.8

out of

5

KINTEK SOLUTION's Lithium Aluminum Alloy (AlLi) granules are a versatile material for our materials science research. They allow us to explore a wide range of properties and applications, leading to groundbreaking discoveries.

Emma Jones

REQUEST A QUOTE

Our professional team will reply to you within one business day. Please feel free to contact us!

Related Products

Lithium cobaltate (LiCoO2) Sputtering Target / Powder / Wire / Block / Granule

Find high-quality Lithium cobaltate (LiCoO2) materials tailored to your needs at reasonable prices. Discover our range of sizes and specifications for sputtering targets, coatings, powders, and more.

Nickel Aluminum Alloy (NiAl) Sputtering Target / Powder / Wire / Block / Granule

Looking for high-quality Nickel Aluminum Alloy materials for your lab? Our experts produce and customize NiAl materials to suit your specific needs. Find a wide range of sizes and specifications for sputtering targets, coating materials, and more at affordable prices.

High Purity Aluminum (Al) Sputtering Target / Powder / Wire / Block / Granule

Get high-quality Aluminum (Al) materials for laboratory use at affordable prices. We offer customized solutions including sputtering targets, powders, foils, ingots & more to meet your unique needs. Order now!

Aluminum Silicon Yttrium alloy (AlSiY) Sputtering Target / Powder / Wire / Block / Granule

Find high-quality AlSiY materials tailored to your lab's unique needs. Our affordable range includes sputtering targets, powders, wire rods, and more in various sizes and shapes. Order now!

Aluminum Copper Alloy (AlCu) Sputtering Target / Powder / Wire / Block / Granule

Get high-quality Aluminum Copper Alloy (AlCu) materials for your laboratory needs at affordable prices. Customized purities, shapes, and sizes available. Shop sputtering targets, coating materials, powders, and more.

Lithium Titanate (Li2TiO3) Sputtering Target / Powder / Wire / Block / Granule

Get high-quality Lithium Titanate materials for your lab needs at affordable prices. We offer tailored solutions with different shapes, sizes, and purities. Find sputtering targets, powders, and more in various specifications.

Aluminum Chromium Alloy (AlCr) Sputtering Target / Powder / Wire / Block / Granule

CVD Diamond coating

CVD Diamond Coating: Superior Thermal Conductivity, Crystal Quality, and Adhesion for Cutting Tools, Friction, and Acoustic Applications

Aluminum Nitride (AlN) Ceramic Sheet

Aluminum nitride (AlN) has the characteristics of good compatibility with silicon. It is not only used as a sintering aid or reinforcing phase for structural ceramics, but its performance far exceeds that of alumina.

Lithium Tantalate (LiTaO3) Sputtering Target / Powder / Wire / Block / Granule

Find affordable Lithium Tantalate materials for laboratory use at our company. We specialize in producing tailored shapes and sizes to suit your unique needs, including sputtering targets, coating materials, and more.

Plasma enhanced evaporation deposition PECVD coating machine

Upgrade your coating process with PECVD coating equipment. Ideal for LED, power semiconductors, MEMS and more. Deposits high-quality solid films at low temps.

Iithium titanate (LiTiO3) Sputtering Target / Powder / Wire / Block / Granule

Get high-quality Iithium Titanate (LiTiO3) materials for your laboratory at reasonable prices. Our tailored solutions cater to different purities, shapes, and sizes, including sputtering targets, coating materials, powders, and more. Order now!

CVD diamond for thermal management

CVD diamond for thermal management: High-quality diamond with thermal conductivity up to 2000 W/mK, ideal for heat spreaders, laser diodes, and GaN on Diamond (GOD) applications.

High Purity Aluminum Oxide (Al2O3) Sputtering Target / Powder / Wire / Block / Granule

Looking for Aluminum Oxide materials for your lab? We offer high-quality Al2O3 products at affordable prices with customizable shapes and sizes to meet your specific needs. Find sputtering targets, coating materials, powders, and more.

CVD boron doped diamond

CVD boron-doped diamond: A versatile material enabling tailored electrical conductivity, optical transparency, and exceptional thermal properties for applications in electronics, optics, sensing, and quantum technologies.

Aluminum Nitride (AlN) Sputtering Target / Powder / Wire / Block / Granule

High-quality Aluminum Nitride (AlN) materials in various shapes and sizes for laboratory use at affordable prices. Explore our range of sputtering targets, coatings, powders, and more. Customized solutions available.

Customer made versatile CVD tube furnace CVD machine

Get your exclusive CVD furnace with KT-CTF16 Customer Made Versatile Furnace. Customizable sliding, rotating, and tilting functions for precise reactions. Order now!

Aluminum Boride (AlB2) Sputtering Target / Powder / Wire / Block / Granule

Looking for high-quality Aluminum Boride materials for your lab? Our custom-tailored AlB2 products come in various shapes and sizes to suit your needs. Check out our range of sputtering targets, coating materials, powders, and more.

Electron Beam Evaporation Coating Oxygen-Free Copper Crucible

Electron Beam Evaporation Coating Oxygen-Free Copper Crucible enables precise co-deposition of various materials. Its controlled temperature and water-cooled design ensure pure and efficient thin film deposition.

Hemispherical Bottom Tungsten / Molybdenum Evaporation Boat

Used for gold plating, silver plating, platinum, palladium, suitable for a small amount of thin film materials. Reduce the waste of film materials and reduce heat dissipation.

Cutting Tool Blanks

CVD Diamond Cutting Tools: Superior Wear Resistance, Low Friction, High Thermal Conductivity for Non-Ferrous Materials, Ceramics, Composites Machining

Alumina (Al2O3) Ceramic Rod-Insulated

Insulated alumina rod is a fine ceramic material. Alumina rods have excellent electrical insulating properties, high chemical resistance and low thermal expansion.

Boron Nitride (BN) Ceramic Tube

Boron nitride (BN) is known for its high thermal stability, excellent electrical insulating properties and lubricating properties.

Nickel Silicon Alloy (NiSi) Sputtering Target / Powder / Wire / Block / Granule

Looking for Nickel Silicon Alloy materials for your lab? Our expertly produced and tailored materials come in various shapes and sizes to suit your unique needs. Get sputtering targets, coating materials, powders, and more at reasonable prices.

Graphite evaporation crucible

Vessels for high temperature applications, where materials are kept at extremely high temperatures to evaporate, allowing thin films to be deposited on substrates.

Aluminized ceramic evaporation boat

Vessel for depositing thin films; has an aluminum-coated ceramic body for improved thermal efficiency and chemical resistance. making it suitable for various applications.

Ceramic Evaporation Boat Set

It can be used for vapor deposition of various metals and alloys. Most metals can be evaporated completely without loss. Evaporation baskets are reusable.1

Hot Tags

sputtering targets high purity materials thin film deposition materials

Shortcut