Products Lab Consumables & Materials Lab Materials Copper Zirconium Alloy (CuZr) Sputtering Target / Powder / Wire / Block / Granule
Copper Zirconium Alloy (CuZr) Sputtering Target / Powder / Wire / Block / Granule

Lab Materials

Copper Zirconium Alloy (CuZr) Sputtering Target / Powder / Wire / Block / Granule

Item Number : LM-CuZr

Price varies based on specs and customizations


Chemical Formula
CuZr
Purity
2N5
Commonly Used Ratio
Cu:Zr=1:1 at% / Cu:Zr=1:2 at%
Shape
discs / wire / block / powder / plates / column targets / step target / custom-made
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At affordable prices, we offer Copper Zirconium Alloy (CuZr) materials for laboratory use. Our specialty lies in manufacturing and customizing Copper Zirconium Alloy (CuZr) materials in various purities, shapes, and sizes to fit your specific needs.

We offer a diverse range of specifications and sizes for sputtering targets (including circular, square, tubular, and irregular shapes), coating materials, cylinders, cones, particles, foils, powders, 3D printing powders, nanometer powders, wire rods, ingots, and blocks, among others.

Details

Copper Zirconium Alloy (CuZr) Sputtering Target
Copper Zirconium Alloy (CuZr) Sputtering Target

About Copper Zirconium Alloy (CuZr)

Copper Zirconium is a versatile material that can be produced in various forms, including bar, ingot, ribbon, wire, shot, sheet, and foil.

For applications that require ultra-high purity and high purity forms, metal powder, submicron powder, and nanoscale materials are also available. These materials are ideal for thin film deposition processes and can be used as targets for both chemical vapor deposition (CVD) and physical vapor deposition (PVD) applications.

In addition, pellets made from Copper Zirconium are also available for use in CVD and PVD processes, providing even more options for material scientists and researchers to customize their applications according to their specific needs.

Ingredient Quality Control

Raw material composition analysis
Through the use of equipment such as ICP and GDMS, the content of metal impurities is detected and analyzed to ensure that it meets the purity standard;

Non-metallic impurities are detected by equipment such as carbon and sulfur analyzers, nitrogen and oxygen analyzers.
Metallographic flaw detection analysis
The target material is inspected using flaw detection equipment to ensure that there are no defects or shrinkage holes inside the product;

Through metallographic testing, the internal grain structure of the target material is analyzed to ensure that the grains are fine and dense.
Appearance and dimension inspection
Product dimensions are measured using micrometers and precision calipers to ensure compliance with drawings;

The surface finish and cleanliness of the product are measured using a surface cleanliness meter.

Conventional Sputtering Target Sizes

Preparation process
hot isostatic pressing, vacuum melting, etc.
Sputtering target shape
plane sputtering target, multi-arc sputtering target, step sputtering target, special-shaped sputtering target
Round sputtering target size
Diameter: 25.4mm / 50mm / 50.8mm / 60mm / 76.2mm / 80mm / 100mm / 101.6mm / 152.4mm
Thickness: 3mm / 4mm / 5mm / 6mm / 6.35mm
Size can be customized.
Square sputtering target size
50×50×3mm / 100×100×4mm / 300×300×5mm, size can be customized

Available Metal Forms

Metal Forms Details

We manufacture almost all the metals listed on the periodic table in a wide range of forms and purities, as well as standard sizes and dimensions. We can also produce custom-made products to meet specific customer requirements, such as size, shape, surface area, composition, and more. The following list provides a sample of the forms we offer, but it is not exhaustive. If you need laboratory consumables, please contact us directly to request a quote.

  • Flat/Planar Forms: Board, Film, Foil, Microfoil, Microleaf, Paper, Plate, Ribbon, Sheet, Strip, Tape, Wafer
  • Preformed Shapes: Anodes, Balls, Bands, Bars, Boats, Bolts, Briquettes, Cathodes, Circles, Coils, Crucibles, Crystals, Cubes, Cups, Cylinders, Discs, Electrodes, Fibers, Filaments, Flanges, Grids, Lenses, Mandrels, Nuts, Parts, Prisms, Pucks, Rings, Rods, Shapes, Shields, Sleeves, Springs, Squares, Sputtering Targets, Sticks, Tubes, Washers, Windows, Wires
  • Microsizes: Beads, Bits, Capsules, Chips, Coins, Dust, Flakes, Grains, Granules, Micropowder, Needles, Particles, Pebbles, Pellets, Pins, Pills, Powder, Shavings, Shot, Slugs, Spheres, Tablets
  • Macrosizes: Billets, Chunks, Cuttings, Fragments, Ingots, Lumps, Nuggets, Pieces, Punchings, Rocks, Scraps, Segments, Turnings
  • Porous and Semi-Porous: Fabric, Foam, Gauze, Honeycomb, Mesh, Sponge, Wool
  • Nanoscale: Nanoparticles, Nanopowders, Nanofoils, Nanotubes, Nanorods, Nanoprisms
  • Others: Concentrate, Ink, Paste, Precipitate, Residue, Samples, Specimens

KinTek specializes in the manufacturing of high-purity and ultra-high-purity materials with a purity range of 99.999% (5N), 99.9999% (6N), 99.99995% (6N5), and in some cases, up to 99.99999% (7N). Our materials are available in specific grades, including UP/UHP, semiconductor, electronic, deposition, fiber optic, and MBE grades. Our high-purity metals, oxides, and compounds are specifically crafted to meet the rigorous demands of high-technology applications and are ideal for use as dopants and precursor materials for thin film deposition, crystal growth of semiconductors, and synthesis of nanomaterials. These materials find use in advanced microelectronics, solar cells, fuel cells, optical materials, and other cutting-edge applications.

Packaging

We use vacuum packaging for our high-purity materials, and each material has specific packaging tailored to its unique characteristics. For instance, our Hf sputter target is externally tagged and labeled to facilitate efficient identification and quality control. We take great care to prevent any damage that could occur during storage or transportation.

FAQ

What is sputtering target?

A sputtering target is a material used in the process of sputter deposition, which involves breaking up the target material into tiny particles that form a spray and coat a substrate, such as a silicon wafer. Sputtering targets are typically metallic elements or alloys, although some ceramic targets are available. They come in a variety of sizes and shapes, with some manufacturers creating segmented targets for larger sputtering equipment. Sputtering targets have a wide range of applications in fields such as microelectronics, thin film solar cells, optoelectronics, and decorative coatings due to their ability to deposit thin films with high precision and uniformity.

How are sputtering targets made?

Sputtering targets are made using a variety of manufacturing processes depending on the properties of the target material and its application. These include vacuum melting and rolling, hot-pressed, special press-sintered process, vacuum hot-pressed, and forged methods. Most sputtering target materials can be fabricated into a wide range of shapes and sizes, with circular or rectangular shapes being the most common. Targets are usually made from metallic elements or alloys, but ceramic targets can also be used. Compound sputtering targets are also available, made from a variety of compounds including oxides, nitrides, borides, sulphides, selenides, tellurides, carbides, crystalline, and composite mixtures.

What is sputtering target used for?

Sputtering targets are used in a process called sputtering to deposit thin films of a material onto a substrate using ions to bombard the target. These targets have a wide range of applications in various fields, including microelectronics, thin film solar cells, optoelectronics, and decorative coatings. They allow for the deposition of thin films of materials onto a variety of substrates with high precision and uniformity, making them an ideal tool for producing precision products. Sputtering targets come in various shapes and sizes and can be specialized to meet the specific requirements of the application.

What are sputtering targets for electronics?

Sputtering targets for electronics are thin discs or sheets of materials such as aluminum, copper, and titanium that are used to deposit thin films onto silicon wafers to create electronic devices like transistors, diodes, and integrated circuits. These targets are used in a process called sputtering, in which atoms of the target material are physically ejected from the surface and deposited onto a substrate by bombarding the target with ions. Sputtering targets for electronics are essential in the production of microelectronics and typically require high precision and uniformity to ensure quality devices.

What is the lifetime of a sputtering target?

The lifetime of a sputtering target depends on factors such as the material composition, purity, and the specific application it is being used for. Generally, targets can last for several hundred to a few thousand hours of sputtering, but this can vary widely depending on the specific conditions of each run. Proper handling and maintenance can also extend the lifetime of a target. In addition, the use of rotary sputtering targets can increase runtimes and reduce the occurrence of defects, making them a more cost-effective option for high volume processes.
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4.8

out of

5

Excellent quality and fast delivery. I highly recommend this product.

Alvaro Duarte

4.9

out of

5

The Copper Zirconium Alloy (CuZr) Sputtering Target is an excellent product. It is durable and produces high-quality results.

Caroline Moreau

4.7

out of

5

I am very satisfied with the Copper Zirconium Alloy (CuZr) Sputtering Target. It is a great value for money and has met all my expectations.

Hassan Patel

4.8

out of

5

The Copper Zirconium Alloy (CuZr) Sputtering Target is a top-notch product. It is easy to use and produces consistent results.

Maria Rodriguez

4.9

out of

5

I highly recommend the Copper Zirconium Alloy (CuZr) Sputtering Target. It is a reliable and efficient product.

Oliver Chen

4.7

out of

5

The Copper Zirconium Alloy (CuZr) Sputtering Target is a game-changer. It has significantly improved the quality of my work.

Sophia Ahmed

4.8

out of

5

I am very impressed with the Copper Zirconium Alloy (CuZr) Sputtering Target. It is a well-made product that is worth every penny.

Victor Kim

4.9

out of

5

The Copper Zirconium Alloy (CuZr) Sputtering Target is a must-have for any laboratory. It is a versatile and high-quality product.

Isabella Garcia

4.7

out of

5

I am extremely satisfied with the Copper Zirconium Alloy (CuZr) Sputtering Target. It is a durable and reliable product.

Lucas Brown

4.8

out of

5

The Copper Zirconium Alloy (CuZr) Sputtering Target is a great investment. It has saved me both time and money.

Mia Johnson

4.9

out of

5

The Copper Zirconium Alloy (CuZr) Sputtering Target is a top-notch product. I highly recommend it to anyone in the market for a sputtering target.

Noah Garcia

4.7

out of

5

I am very happy with the Copper Zirconium Alloy (CuZr) Sputtering Target. It is a well-made and durable product.

Olivia Patel

4.8

out of

5

The Copper Zirconium Alloy (CuZr) Sputtering Target is a great addition to my laboratory. It is a reliable and efficient product.

Sophia Ahmed

4.9

out of

5

I am very impressed with the Copper Zirconium Alloy (CuZr) Sputtering Target. It is a well-made product that is worth every penny.

Victor Kim

4.7

out of

5

I am extremely satisfied with the Copper Zirconium Alloy (CuZr) Sputtering Target. It is a durable and reliable product.

Isabella Garcia

4.8

out of

5

The Copper Zirconium Alloy (CuZr) Sputtering Target is a great investment. It has saved me both time and money.

Lucas Brown

4.9

out of

5

The Copper Zirconium Alloy (CuZr) Sputtering Target is a top-notch product. I highly recommend it to anyone in the market for a sputtering target.

Mia Johnson

4.7

out of

5

I am very happy with the Copper Zirconium Alloy (CuZr) Sputtering Target. It is a well-made and durable product.

Noah Garcia

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Catalog of Sputtering Targets

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