The beam of electrons in electron beam (E-beam) evaporation is used to heat and vaporize a sample within a vacuum environment.
4 Key Steps Explained
1. Generation and Steering of the Electron Beam
The electron beam is generated from a filament. It is accelerated to high kinetic energy (up to 10 kV) through a high-voltage electric field. Electric and magnetic fields are used to steer the beam precisely onto the source material. The source material is usually in the form of pellets or a block placed in a crucible.
2. Energy Transfer and Vaporization
When the electron beam strikes the source material, its kinetic energy is converted into heat. This raises the temperature of the material. As the material heats up, its surface atoms gain enough energy to overcome the binding forces holding them to the bulk material. This causes them to leave the surface as vapor.
3. Evaporation and Deposition
The vaporized atoms or molecules traverse the vacuum chamber at thermal energy (less than 1 eV). They are undisturbed by other particles, ensuring a "line of sight" deposition onto a substrate positioned at a working distance of 300 mm to 1 meter. This method is particularly useful for depositing materials with high melting points that cannot be easily evaporated by traditional methods. It also allows for high deposition rates at relatively low substrate temperatures.
4. Advantages and Considerations
The low arrival energy of the evaporated material is beneficial for sensitive substrates. However, the radiation from the intense electron beam energy transfer below the substrate can be a significant factor. The use of a cooled crucible helps prevent impurity diffusion from the crucible to the charge. This maintains the purity of the evaporated material.
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