When it comes to measuring the thickness of thin films, one technique stands out: spectroscopic ellipsometry.
Which of the Following Measurement Techniques is Commonly Used to Find the Thickness of Thin Films? (4 Key Methods Explored)
1. Spectroscopic Ellipsometry
Spectroscopic ellipsometry is a non-destructive and non-contact method.
It can measure the thickness of transparent and semi-transparent single- and multilayer films.
This method is widely used in industries such as electronics and semiconductors.
It allows for the simultaneous measurement of film thickness and optical properties like the refractive index and extinction coefficient.
The suitable thickness range for spectroscopic ellipsometry is between 1nm and 1000nm.
However, it may not accurately measure the thickness of thin films on transparent substrates used in optics.
2. Stylus Profilometry
Stylus profilometry is another technique that can be used for mechanical measurements of film thickness.
It requires the presence of a groove or step on the film surface.
3. Interferometry
Interferometry is also a method that can be used for measuring film thickness.
Like stylus profilometry, it requires specific surface features to work effectively.
4. Other Techniques
For applications involving transparent substrates used in optics, other methods like XRR, cross-sectional SEM, and cross-sectional TEM can be explored.
Continue Exploring, Consult Our Experts
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Our range of spectroscopic ellipsometry equipment is perfect for measuring transparent and semitransparent single- and multilayer films, with a thickness range of 1nm to 1000nm.
With the ability to calculate the refractive index of the film, our non-destructive and non-contact method is trusted by the electronics and semiconductor industries.
For applications involving transparent substrates used in optics, explore our other methods like XRR, cross-sectional SEM, and cross-sectional TEM.
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