Knowledge How is graphene prepared by CVD? (5 Key Steps Explained)
Author avatar

Tech Team · Kintek Solution

Updated 1 month ago

How is graphene prepared by CVD? (5 Key Steps Explained)

Graphene, a single-atom thick film, is prepared through a process called chemical vapor deposition (CVD). This method involves the decomposition of hydrocarbon gases on a metal substrate at high temperatures. It allows for the control of graphene layer thickness and the production of high-quality, large-area graphene.

5 Key Steps Explained

How is graphene prepared by CVD? (5 Key Steps Explained)

1. Preparation of the Metal Substrate

The metal substrate, typically made of copper, platinum, or iridium, is placed in a high-temperature furnace.

2. Introduction of Hydrocarbon Gas

A hydrocarbon gas, such as methane or ethylene, is introduced into the reaction chamber.

3. Decomposition and Formation of Graphene

At high temperatures (around 1000°C), the hydrocarbon gas decomposes into individual carbon atoms which then bind to the surface of the metal. These carbon atoms assemble to form a continuous film of graphene.

4. Control Parameters

The thickness and quality of the graphene can be controlled by adjusting parameters such as gas flow rate, temperature, and time of exposure.

5. Separation and Transfer

After formation, the graphene is separated from the metal substrate and transferred to a desired substrate for further use.

Detailed Explanation

Metal Substrate Role

The metal substrate acts as both a catalyst to lower the energy barrier of the reaction and a surface for graphene nucleation. The choice of metal affects the quality and growth mechanism of graphene. For instance, copper is often used due to its ability to promote the growth of single-layer graphene.

Hydrocarbon Gas Decomposition

The hydrocarbon gas decomposes at the high temperatures inside the reaction chamber, releasing carbon atoms. These atoms are highly reactive and readily bond to the metal surface.

Formation of Graphene

The carbon atoms arrange themselves into a hexagonal lattice structure characteristic of graphene. This process is facilitated by the catalytic properties of the metal substrate, which helps in the efficient formation of the graphene lattice.

Control Parameters

By adjusting the gas flow rate, temperature, and time, the conditions can be optimized to produce graphene with desired properties. For example, increasing the temperature or gas flow rate can lead to thicker graphene layers.

Separation and Transfer

Once the graphene is formed, it is typically separated from the metal substrate using a transfer process. This involves etching away the metal or using a polymer support to lift the graphene off the metal and place it onto another substrate where it will be used for applications such as electronics or composites.

Continue exploring, consult our experts

Discover the unparalleled precision and scalability of KINTEK SOLUTION's CVD graphene production. With our cutting-edge technology and expertly crafted metal substrates, we ensure the highest quality and controlled thickness in every batch. Experience the transformative power of our process and elevate your research or industrial applications with large-area, high-quality graphene. Elevate your projects today – explore KINTEK SOLUTION for all your CVD graphene needs!

Related Products

CVD Diamond coating

CVD Diamond coating

CVD Diamond Coating: Superior Thermal Conductivity, Crystal Quality, and Adhesion for Cutting Tools, Friction, and Acoustic Applications

Drawing die nano-diamond coating HFCVD Equipment

Drawing die nano-diamond coating HFCVD Equipment

The nano-diamond composite coating drawing die uses cemented carbide (WC-Co) as the substrate, and uses the chemical vapor phase method ( CVD method for short ) to coat the conventional diamond and nano-diamond composite coating on the surface of the inner hole of the mold.

CVD diamond for thermal management

CVD diamond for thermal management

CVD diamond for thermal management: High-quality diamond with thermal conductivity up to 2000 W/mK, ideal for heat spreaders, laser diodes, and GaN on Diamond (GOD) applications.

CVD boron doped diamond

CVD boron doped diamond

CVD boron-doped diamond: A versatile material enabling tailored electrical conductivity, optical transparency, and exceptional thermal properties for applications in electronics, optics, sensing, and quantum technologies.

Cylindrical Resonator MPCVD Diamond Machine for lab diamond growth

Cylindrical Resonator MPCVD Diamond Machine for lab diamond growth

Learn about Cylindrical Resonator MPCVD Machine, the microwave plasma chemical vapor deposition method used for growing diamond gemstones and films in the jewelry and semi-conductor industries. Discover its cost-effective advantages over traditional HPHT methods.

Bell-jar Resonator MPCVD Diamond Machine for lab and diamond growth

Bell-jar Resonator MPCVD Diamond Machine for lab and diamond growth

Get high-quality diamond films with our Bell-jar Resonator MPCVD machine designed for lab and diamond growth. Discover how Microwave Plasma Chemical Vapor Deposition works for growing diamonds using carbon gas and plasma.

Graphite evaporation crucible

Graphite evaporation crucible

Vessels for high temperature applications, where materials are kept at extremely high temperatures to evaporate, allowing thin films to be deposited on substrates.

Electron Beam Evaporation Graphite Crucible

Electron Beam Evaporation Graphite Crucible

A technology mainly used in the field of power electronics. It is a graphite film made of carbon source material by material deposition using electron beam technology.

915MHz MPCVD Diamond Machine

915MHz MPCVD Diamond Machine

915MHz MPCVD Diamond Machine and its multi-crystal effective growth, the maximum area can reach 8 inches, the maximum effective growth area of single crystal can reach 5 inches. This equipment is mainly used for the production of large-size polycrystalline diamond films, the growth of long single crystal diamonds, the low-temperature growth of high-quality graphene, and other materials that require energy provided by microwave plasma for growth.

Plasma enhanced evaporation deposition PECVD coating machine

Plasma enhanced evaporation deposition PECVD coating machine

Upgrade your coating process with PECVD coating equipment. Ideal for LED, power semiconductors, MEMS and more. Deposits high-quality solid films at low temps.

RF PECVD System Radio Frequency Plasma-Enhanced Chemical Vapor Deposition

RF PECVD System Radio Frequency Plasma-Enhanced Chemical Vapor Deposition

RF-PECVD is an acronym for "Radio Frequency Plasma-Enhanced Chemical Vapor Deposition." It deposits DLC (Diamond-like carbon film) on germanium and silicon substrates. It is utilized in the 3-12um infrared wavelength range.

High Thermal Conductivity Film Graphitization Furnace

High Thermal Conductivity Film Graphitization Furnace

The high thermal conductivity film graphitization furnace has uniform temperature, low energy consumption and can operate continuously.

Ultra-high temperature graphitization furnace

Ultra-high temperature graphitization furnace

The ultra-high temperature graphitization furnace utilizes medium frequency induction heating in a vacuum or inert gas environment. The induction coil generates an alternating magnetic field, inducing eddy currents in the graphite crucible, which heats up and radiates heat to the workpiece, bringing it to the desired temperature. This furnace is primarily used for graphitization and sintering of carbon materials, carbon fiber materials, and other composite materials.

Horizontal high temperature graphitization furnace

Horizontal high temperature graphitization furnace

Horizontal Graphitization Furnace: This type of furnace is designed with the heating elements placed horizontally, allowing for uniform heating of the sample. It's well-suited for graphitizing large or bulky samples that require precise temperature control and uniformity.

Continuous graphitization furnace

Continuous graphitization furnace

High-temperature graphitization furnace is a professional equipment for graphitization treatment of carbon materials. It is a key equipment for the production of high-quality graphite products. It has high temperature, high efficiency and uniform heating. It is suitable for various high-temperature treatments and graphitization treatments. It is widely used in metallurgy, electronics, aerospace, etc. industry.

IGBT experimental graphitization furnace

IGBT experimental graphitization furnace

IGBT experimental graphitization furnace, a tailored solution for universities and research institutions, with high heating efficiency, user-friendliness, and precise temperature control.

Vertical high temperature graphitization furnace

Vertical high temperature graphitization furnace

Vertical high temperature graphitization furnace for carbonization and graphitization of carbon materials up to 3100℃.Suitable for shaped graphitization of carbon fiber filaments and other materials sintered in a carbon environment.Applications in metallurgy, electronics, and aerospace for producing high-quality graphite products like electrodes and crucibles.

Large Vertical Graphitization Furnace

Large Vertical Graphitization Furnace

A large vertical high-temperature graphitization furnace is a type of industrial furnace used for the graphitization of carbon materials, such as carbon fiber and carbon black. It is a high-temperature furnace that can reach temperatures of up to 3100°C.

Cutting Tool Blanks

Cutting Tool Blanks

CVD Diamond Cutting Tools: Superior Wear Resistance, Low Friction, High Thermal Conductivity for Non-Ferrous Materials, Ceramics, Composites Machining


Leave Your Message