Discusses the difficulties of TiN film growth under AC power and proposes solutions like DC sputtering and pulsed DC.
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An in-depth look at the principles, types, gas applications, and practical uses of PVD coating processes.
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An in-depth exploration of thin film system design principles, technological considerations, and practical applications in various fields.
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Analyzing factors causing no film deposition despite glow in magnetron sputtering.
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Discusses the key factors influencing the uniformity of thin film deposition in magnetron sputtering, including equipment parameters, sputtering power, gas pressure, magnetic field configuration, substrate properties, and more.
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Guidelines on choosing the right vacuum coating materials based on application, material properties, deposition methods, economy, substrate compatibility, and safety.
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Explores reasons why rhenium targets struggle to glow during magnetron sputtering and offers optimization suggestions.
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Key parameters influencing the sputtering effect in magnetron sputtering, including air pressure, power, target distance, substrate type, and more.
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Exploring color variation, control methods, and practical applications of silicon oxide thin films.
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Guidelines and precautions for preparing PZT film layers using magnetron sputtering.
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Key factors in successful evaporative coating on flexible materials, ensuring quality and performance.
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Overview of bias power supply types in magnetron sputtering and their roles in improving film adhesion and density.
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This article explains the distinctions and applications of DC, MF, and RF sputtering techniques in thin film preparation.
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Explains why target material sparks during magnetron sputtering and offers solutions to prevent it.
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An in-depth look at sputtering deposition technology, its mechanisms, types, and applications.
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Overview of CVD technology, its principles, types, applications, process characteristics, and advantages.
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An overview of thin film deposition techniques, focusing on Chemical Vapor Deposition (CVD) and Physical Vapor Deposition (PVD) processes in semiconductor manufacturing.
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This article details various CVD technologies used in semiconductor and thin film deposition industries.
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Explores the impact of MPCVD cultured diamonds on various industries and strategies for cost reduction and efficiency improvement.
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Key considerations for selecting an MPCVD device for diamond growth.
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An in-depth exploration of MPCVD technology, its components, advantages, and factors affecting film growth.
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Discusses different heating methods in labs and their suitability for various experiments.
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An in-depth look at the hydraulic hot press, its components, features, advantages, and applications.
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Detailed safety and operational guidelines for using a flat-plate hot press in lamination experiments, including pre-operation checks, material preparation, heating procedures, and post-processing.
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A comprehensive guide on preparing samples for infrared spectroscopy analysis, covering gas, liquid, and solid samples.
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An overview of infrared spectroscopy methods, focusing on the pressing method and sample preparation with potassium bromide.
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Detailed safety measures and operational steps for using a flat-plate hot press in lamination experiments.
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An overview of the wide-ranging applications of cold isostatic pressing technology across various industries.
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Explains the mechanism, factors, and process of cold isostatic pressing in powder molding.
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Explores the use of HIP technology in special ceramics, focusing on preparation, characteristics, and industry trends.
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