Products Lab Consumables & Materials Lab Materials Boron Carbide (BC) Sputtering Target / Powder / Wire / Block / Granule
Boron Carbide (BC) Sputtering Target / Powder / Wire / Block / Granule

Lab Materials

Boron Carbide (BC) Sputtering Target / Powder / Wire / Block / Granule

Item Number : LM-BC

Price varies based on specs and customizations


Chemical Formula
BC
Purity
2N5
Shape
discs / wire / block / powder / plates / column targets / step target / custom-made
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At reasonable prices, we offer Boron Carbide (BC) materials for laboratory use. We specialize in producing and customizing BC materials of various purities, shapes, and sizes to meet your specific needs. Our range of offerings includes sputtering targets (circular, square, tubular, irregular), coating materials, cylinders, cones, particles, foils, powders, 3D printing powders, nanometer powders, wire rods, ingots, and blocks, among others.

Details

Boron Carbide (BC) Sputtering Target
Boron Carbide (BC) Sputtering Target

About Boron Carbide (BC)

We specialize in producing high-purity Boron Carbide (BC) Sputtering Targets for use in semiconductor, chemical vapor deposition (CVD), physical vapor deposition (PVD), display, and optical applications. Our sputtering targets have the highest possible density and the smallest average grain sizes.

Our standard sputtering targets for thin films are available in monoblock or bonded form with planar target dimensions and configurations up to 820 mm. They come with hole drill locations, threading, beveling, grooves, and backing designed to work with both older and latest sputtering devices, including large area coating for solar energy or fuel cells and flip-chip applications. We offer all shapes and configurations of targets compatible with all standard guns.

All targets undergo thorough analysis using the best demonstrated techniques, including X-Ray Fluorescence (XRF), Glow Discharge Mass Spectrometry (GDMS), and Inductively Coupled Plasma (ICP).

Sputtering is the process of thin film deposition using ultra high purity sputtering metallic or oxide material onto another solid substrate through the controlled removal and conversion of the target material into a directed gaseous/plasma phase via ionic bombardment. Our materials are produced using crystallization, solid-state, and other ultra high purification processes such as sublimation.

Ingredient Quality Control

Raw material composition analysis
Through the use of equipment such as ICP and GDMS, the content of metal impurities is detected and analyzed to ensure that it meets the purity standard;

Non-metallic impurities are detected by equipment such as carbon and sulfur analyzers, nitrogen and oxygen analyzers.
Metallographic flaw detection analysis
The target material is inspected using flaw detection equipment to ensure that there are no defects or shrinkage holes inside the product;

Through metallographic testing, the internal grain structure of the target material is analyzed to ensure that the grains are fine and dense.
Appearance and dimension inspection
Product dimensions are measured using micrometers and precision calipers to ensure compliance with drawings;

The surface finish and cleanliness of the product are measured using a surface cleanliness meter.

Conventional Sputtering Target Sizes

Preparation process
hot isostatic pressing, vacuum melting, etc.
Sputtering target shape
plane sputtering target, multi-arc sputtering target, step sputtering target, special-shaped sputtering target
Round sputtering target size
Diameter: 25.4mm / 50mm / 50.8mm / 60mm / 76.2mm / 80mm / 100mm / 101.6mm / 152.4mm
Thickness: 3mm / 4mm / 5mm / 6mm / 6.35mm
Size can be customized.
Square sputtering target size
50×50×3mm / 100×100×4mm / 300×300×5mm, size can be customized

Available Metal Forms

Metal Forms Details

We manufacture almost all the metals listed on the periodic table in a wide range of forms and purities, as well as standard sizes and dimensions. We can also produce custom-made products to meet specific customer requirements, such as size, shape, surface area, composition, and more. The following list provides a sample of the forms we offer, but it is not exhaustive. If you need laboratory consumables, please contact us directly to request a quote.

  • Flat/Planar Forms: Board, Film, Foil, Microfoil, Microleaf, Paper, Plate, Ribbon, Sheet, Strip, Tape, Wafer
  • Preformed Shapes: Anodes, Balls, Bands, Bars, Boats, Bolts, Briquettes, Cathodes, Circles, Coils, Crucibles, Crystals, Cubes, Cups, Cylinders, Discs, Electrodes, Fibers, Filaments, Flanges, Grids, Lenses, Mandrels, Nuts, Parts, Prisms, Pucks, Rings, Rods, Shapes, Shields, Sleeves, Springs, Squares, Sputtering Targets, Sticks, Tubes, Washers, Windows, Wires
  • Microsizes: Beads, Bits, Capsules, Chips, Coins, Dust, Flakes, Grains, Granules, Micropowder, Needles, Particles, Pebbles, Pellets, Pins, Pills, Powder, Shavings, Shot, Slugs, Spheres, Tablets
  • Macrosizes: Billets, Chunks, Cuttings, Fragments, Ingots, Lumps, Nuggets, Pieces, Punchings, Rocks, Scraps, Segments, Turnings
  • Porous and Semi-Porous: Fabric, Foam, Gauze, Honeycomb, Mesh, Sponge, Wool
  • Nanoscale: Nanoparticles, Nanopowders, Nanofoils, Nanotubes, Nanorods, Nanoprisms
  • Others: Concentrate, Ink, Paste, Precipitate, Residue, Samples, Specimens

KinTek specializes in the manufacturing of high-purity and ultra-high-purity materials with a purity range of 99.999% (5N), 99.9999% (6N), 99.99995% (6N5), and in some cases, up to 99.99999% (7N). Our materials are available in specific grades, including UP/UHP, semiconductor, electronic, deposition, fiber optic, and MBE grades. Our high-purity metals, oxides, and compounds are specifically crafted to meet the rigorous demands of high-technology applications and are ideal for use as dopants and precursor materials for thin film deposition, crystal growth of semiconductors, and synthesis of nanomaterials. These materials find use in advanced microelectronics, solar cells, fuel cells, optical materials, and other cutting-edge applications.

Packaging

We use vacuum packaging for our high-purity materials, and each material has specific packaging tailored to its unique characteristics. For instance, our Hf sputter target is externally tagged and labeled to facilitate efficient identification and quality control. We take great care to prevent any damage that could occur during storage or transportation.

FAQ

What Is Sputtering Target?

A sputtering target is a material used in the process of sputter deposition, which involves breaking up the target material into tiny particles that form a spray and coat a substrate, such as a silicon wafer. Sputtering targets are typically metallic elements or alloys, although some ceramic targets are available. They come in a variety of sizes and shapes, with some manufacturers creating segmented targets for larger sputtering equipment. Sputtering targets have a wide range of applications in fields such as microelectronics, thin film solar cells, optoelectronics, and decorative coatings due to their ability to deposit thin films with high precision and uniformity.

How Are Sputtering Targets Made?

Sputtering targets are made using a variety of manufacturing processes depending on the properties of the target material and its application. These include vacuum melting and rolling, hot-pressed, special press-sintered process, vacuum hot-pressed, and forged methods. Most sputtering target materials can be fabricated into a wide range of shapes and sizes, with circular or rectangular shapes being the most common. Targets are usually made from metallic elements or alloys, but ceramic targets can also be used. Compound sputtering targets are also available, made from a variety of compounds including oxides, nitrides, borides, sulphides, selenides, tellurides, carbides, crystalline, and composite mixtures.

What Is Sputtering Target Used For?

Sputtering targets are used in a process called sputtering to deposit thin films of a material onto a substrate using ions to bombard the target. These targets have a wide range of applications in various fields, including microelectronics, thin film solar cells, optoelectronics, and decorative coatings. They allow for the deposition of thin films of materials onto a variety of substrates with high precision and uniformity, making them an ideal tool for producing precision products. Sputtering targets come in various shapes and sizes and can be specialized to meet the specific requirements of the application.

What Are Sputtering Targets For Electronics?

Sputtering targets for electronics are thin discs or sheets of materials such as aluminum, copper, and titanium that are used to deposit thin films onto silicon wafers to create electronic devices like transistors, diodes, and integrated circuits. These targets are used in a process called sputtering, in which atoms of the target material are physically ejected from the surface and deposited onto a substrate by bombarding the target with ions. Sputtering targets for electronics are essential in the production of microelectronics and typically require high precision and uniformity to ensure quality devices.

What Is The Lifetime Of A Sputtering Target?

The lifetime of a sputtering target depends on factors such as the material composition, purity, and the specific application it is being used for. Generally, targets can last for several hundred to a few thousand hours of sputtering, but this can vary widely depending on the specific conditions of each run. Proper handling and maintenance can also extend the lifetime of a target. In addition, the use of rotary sputtering targets can increase runtimes and reduce the occurrence of defects, making them a more cost-effective option for high volume processes.
View more faqs for this product

4.9

out of

5

KINTEK's Boron Carbide products are exceptional! The quality is top-notch, and the delivery is incredibly fast. Highly recommended!

Alberto Rodriguez

4.8

out of

5

I'm thoroughly impressed with KINTEK's Boron Carbide products. They are of exceptional quality and offer great value for money. I highly recommend them!

Sophia Patel

4.7

out of

5

KINTEK's Boron Carbide products are a game-changer! They are durable, reliable, and technologically advanced. I'm very satisfied with my purchase.

Liam Brown

4.6

out of

5

I've been using KINTEK's Boron Carbide products for years, and I've never been disappointed. They are consistently high-quality and meet all my expectations.

Isabella Garcia

4.9

out of

5

KINTEK's Boron Carbide products are simply the best. They are reliable, durable, and deliver exceptional results. I highly recommend them to anyone looking for top-quality products.

Oliver Jones

4.8

out of

5

I'm amazed by the quality and performance of KINTEK's Boron Carbide products. They have exceeded my expectations and made my work so much easier. Highly recommended!

Amelia White

4.7

out of

5

KINTEK's Boron Carbide products are a must-have for any laboratory. They are technologically advanced, durable, and provide accurate results. I highly recommend them!

Lucas Smith

4.6

out of

5

I've been using KINTEK's Boron Carbide products for a while now, and I'm always impressed with their quality. They are reliable, durable, and deliver consistent results. I highly recommend them!

Harper Green

4.9

out of

5

KINTEK's Boron Carbide products are a great investment. They are durable, reliable, and offer excellent value for money. I highly recommend them to anyone looking for high-quality products.

Jackson Kim

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Catalog of Sputtering Targets

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