The high temperature for CVD (Chemical Vapor Deposition) processes typically ranges from 600 to 1100°C. However, in the case of thermal CVD, the surfaces should be kept at temperatures between 800 and 1000°C. These high temperatures are required to facilitate the chemical reactions and deposition of the desired material onto the substrate.
It is important to note that the high temperatures involved in CVD processes can have significant thermal effects on the substrate material. For example, steels may be heated into the austenite phase region, and additional heat treatment may be required to optimize the properties of the substrate.
There are also variants of CVD, such as plasma-assisted CVD (PACVD), which utilize electrical discharge in a low-pressure gas to accelerate the CVD reaction. This can lower the reaction temperatures by several hundred degrees Celsius.
Overall, the temperature requirements for CVD processes depend on the specific application and nature of the deposited material. It is crucial to maintain the appropriate temperature range to achieve the desired coating properties and adhesion strength.
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