Chat with us for quick and direct communication.
Immediately reply on working days (within 8 hours on holidays)
KinTek sample preparation equipment includes sample crushing,milling, as while as while sieving equipment, hydraulic press equipment includes manual press, electric press, isostatic press, hot press and press filtering machine.
KinTek supplies a broad range of high-temperature furnaces, including lab, pilot production, and industrial production furnaces, with a temperature range of up to 3000 ℃. One of KinTek's advantages is the ability to create custom-made furnaces tailored to specific functions, such as different heating methods and speeds, extra high and dynamic vacuums, controlled atmospheres and gas circuits, automated mechanical structures, and software and hardware development.
KinTek offers a range of lab consumables and materials, including evaporation materials, targets, metals, electrochemistry parts, as well as powders, pellets, wires, strips, foils, plates, and more.
KinTek bio-chem equipment comprises rotary evaporators, glass and stainless steel reactors, distillation systems, circulating heaters and chillers, as well as vacuum equipment.
Iron Gallium Alloy (FeGa) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-FeGa
Cobalt Telluride (CoTe) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-CoTe
Copper Zirconium Alloy (CuZr) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-CuZr
Copper Nickel Alloy (CuNi) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-CuNi
Copper Nickel Indium Alloy (CuNiIn) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-CuNiIn
Aluminum Copper Alloy (AlCu) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-AlCu
Cobalt Silicide (CoSi2) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-CoSi2
Zirconium Silicon Alloy (ZrSi) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-ZrSi
Nickel Silicon Alloy (NiSi) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-NiSi
Zirconium Silver Alloy (ZrAg) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-ZrAg
Tin Bismuth Silver Alloy (SnBiAg) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-SnBiAg
Chromium Nickel Alloy (CrNi) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-CrNi
Nickel Aluminum Alloy (NiAl) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-NiAl
Nickel Niobium Alloy (NiNb) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-NiNb
Iron Nickel Alloy (FeNi) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-FeNi
Manganese Cobalt Nickel alloy (MnCoNi) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-MnCoNi
Boron Nitride (BN) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-BN
Aluminum Nitride (AlN) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-AlN
Silicon Nitride (Si3N4) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-Si3N4
Titanium Nitride (TiN) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-TiN
Tantalum Nitride (TaN) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-TaN
Zinc Sulfide (ZnS) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-ZnS
Molybdenum Sulfide (MoS2) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-MoS2
Tin Sulfide (SnS2) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-SnS2
Tungsten Sulfide (WS2) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-WS2
Cadmium Sulfide (CdS) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-CdS
Boron Carbide (B4C) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-B4C
Hafnium Carbide (HfC) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-HfC
Tungsten Carbide (WC) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-WC
Molybdenum Carbide (Mo2C) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-Mo2C
Our professional team will reply to you within one business day. Please feel free to contact us!
Dive into the world of Spark Plasma Sintering (SPS) furnaces, their innovative technology, and applications in material science. Learn how SPS furnaces revolutionize the sintering process with high-speed, efficiency, and precision.
Explore the intricacies of handheld coating thickness gauges, their applications in electroplating, automotive paint, and powder coatings. Learn how to choose and use these instruments effectively for quality control and cost efficiency.
Precautions when installing MoSi2 heating elements
Discover the transformative potential of molybdenum vacuum furnaces in aerospace, automotive, and various other industries. Learn about their advanced features, applications, and insulation techniques for high-performance operations.
Discover the world of Spark Plasma Sintering Furnaces (SPS). This comprehensive guide covers everything from its advantages and applications to its process and equipment. Learn how SPS furnaces can revolutionize your sintering operations.
Discover the comprehensive guide to electrode fixtures, covering various types, design considerations, and their indispensable role in industries like electroplating, welding, and electrochemical cells.
Hot Isostatic Pressing(HIP ) is a technology used to densify materials at high temperatures and pressures. The process involves placing a material in a sealed container, which is then pressurized with an inert gas and heated to a high temperature.
Hot Isostatic Pressing (HIP) is a powerful manufacturing process that plays a crucial role in enhancing the density of ceramic materials and reducing porosity in metals. It is widely utilized in various industries, including aerospace, powder metallurgy, and component manufacturing.
Cold isostatic pressing (CIP) services utilize extremely high pressures to sterilize products or cold compact powders. CIP is particularly effective in producing complex shapes and increasing the final density of materials.
Isostatic presses play a crucial role in various industries, offering unique capabilities for material consolidation and product creation. These powerful machines apply equal pressure from all directions, resulting in products with uniform density and reduced defects. Isostatic presses are divided into two main types: Cold Isostatic Presses (CIP) and Hot Isostatic Presses (HIP). Each type functions under different conditions, allowing for a wide range of applications.
Lab presses are an essential tool in research and development for a wide range of industries, including pharmaceuticals, materials science, and electronics.
Cold isostatic pressing (CIP) is a method of processing materials by using liquid pressure to compact powder. It is similar to metal mold processing and is based on Pascal's law.
Warm Isostatic Pressing (WIP) is a high-pressure technique used to enhance the density and reduce the defects of materials. It involves subjecting a material to high pressure and high temperature while simultaneously applying an inert gas, which uniformly compresses the material.
Isostatic pressing is a process used in the production of high-performance materials and components. It involves applying uniform pressure on all sides of a material or part, resulting in a more uniform density and improved mechanical properties.
The two most common techniques used for thin film deposition are evaporation and sputtering.
Tungsten has a number of properties that make it well-suited for use in high-temperature furnaces.