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KinTek sample preparation equipment includes sample crushing,milling, as while as while sieving equipment, hydraulic press equipment includes manual press, electric press, isostatic press, hot press and press filtering machine.
KinTek supplies a broad range of high-temperature furnaces, including lab, pilot production, and industrial production furnaces, with a temperature range of up to 3000 ℃. One of KinTek's advantages is the ability to create custom-made furnaces tailored to specific functions, such as different heating methods and speeds, extra high and dynamic vacuums, controlled atmospheres and gas circuits, automated mechanical structures, and software and hardware development.
KinTek offers a range of lab consumables and materials, including evaporation materials, targets, metals, electrochemistry parts, as well as powders, pellets, wires, strips, foils, plates, and more.
KinTek bio-chem equipment comprises rotary evaporators, glass and stainless steel reactors, distillation systems, circulating heaters and chillers, as well as vacuum equipment.
High Purity Titanium Dioxide (TiO2) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-TiO2
High Purity Zirconium Oxide (ZrO2) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-ZrO2
High Purity Tungsten Oxide (WO3) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-WO3
High Purity Niobium Oxide (Nb2O5) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-Nb2O5
High Purity Tantalum Oxide (Ta2O5) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-Ta2O5
High Purity Molybdenum Oxide (MoO3) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-MoO3
High Purity Scandium Oxide (Sc2O3) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-Sc2O3
High Purity Aluminum Oxide (Al2O3) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-Al2O3
High Purity Zinc Oxide (ZnO) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-ZnO
High Purity Bismuth Oxide (Bi2O3) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-Bi2O3
High Purity Chromium Oxide (Cr2O3) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-Cr2O3
High Purity Nickel Oxide (Ni2O3) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-Ni2O3
High Purity Vanadium Oxide (V2O3) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-V2O3
High Purity Yttrium Oxide (Y2O3) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-Y2O3
High Purity Cerium Oxide (CeO2) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-CeO2
High Purity Erbium Oxide (Er2O3) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-Er2O3
High Purity Samarium Oxide (Sm2O3) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-Sm2O3
High Purity Neodymium Oxide (Nd2O3) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-Nd2O3
High Purity Iron Oxide (Fe3O4) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-Fe3O4
Tantalum Tungsten Alloy (TaW) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-TaW
Titanium Silicon Alloy (TiSi) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-TiSi
Tungsten Titanium Alloy (WTi) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-WTi
Titanium Nickel Silver Alloy (TiNiAg) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-TiNiAg
Aluminum Silicon Yttrium alloy (AlSiY) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-AlSiY
Lithium Aluminum Alloy (AlLi) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-AlLi
Aluminum Chromium Alloy (AlCr) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-AlCr
Nickel Chromium Alloy (NiCr) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-NiCr
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Dive into the comprehensive guide on Warm Isostatic Pressing (WIP), its technology, applications, and benefits in material processing. Discover how WIP enhances material properties and its role in advanced manufacturing.
Explore the advanced features, wide-ranging applications, and significant benefits of handheld alloy analyzers. Learn how these devices revolutionize alloy analysis with fast, accurate, and non-destructive testing methods.
Cold isostatic pressing (CIP) services utilize extremely high pressures to sterilize products or cold compact powders. CIP is particularly effective in producing complex shapes and increasing the final density of materials.
Warm Isostatic Press (WIP) is a type of isostatic press that uses a combination of heat and pressure to create high-quality parts. The WIP process involves placing a part inside a flexible mold, which is then filled with a gas or liquid media.
Isostatic presses play a crucial role in various industries, offering unique capabilities for material consolidation and product creation. These powerful machines apply equal pressure from all directions, resulting in products with uniform density and reduced defects. Isostatic presses are divided into two main types: Cold Isostatic Presses (CIP) and Hot Isostatic Presses (HIP). Each type functions under different conditions, allowing for a wide range of applications.
Warm Isostatic Pressing (WIP) is a high-pressure technique used to enhance the density and reduce the defects of materials. It involves subjecting a material to high pressure and high temperature while simultaneously applying an inert gas, which uniformly compresses the material.
Tungsten has a number of properties that make it well-suited for use in high-temperature furnaces.
In X-ray fluorescence (XRF) analysis, sample preparation is an important step because it can significantly impact both the quality and the efficiency of the analysis.