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KinTek sample preparation equipment includes sample crushing,milling, as while as while sieving equipment, hydraulic press equipment includes manual press, electric press, isostatic press, hot press and press filtering machine.
KinTek supplies a broad range of high-temperature furnaces, including lab, pilot production, and industrial production furnaces, with a temperature range of up to 3000 ℃. One of KinTek's advantages is the ability to create custom-made furnaces tailored to specific functions, such as different heating methods and speeds, extra high and dynamic vacuums, controlled atmospheres and gas circuits, automated mechanical structures, and software and hardware development.
KinTek offers a range of lab consumables and materials, including evaporation materials, targets, metals, electrochemistry parts, as well as powders, pellets, wires, strips, foils, plates, and more.
KinTek bio-chem equipment comprises rotary evaporators, glass and stainless steel reactors, distillation systems, circulating heaters and chillers, as well as vacuum equipment.
High Purity Silicon (Si) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-SI
High Purity Tin (Sn) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-SN
High Purity Tantalum (Ta) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-TA
High Purity Tellurium (Te) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-TE
High Purity Titanium (Ti) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-TI
High Purity Vanadium (V) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-V
High Purity Tungsten (W) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-W
High Purity Zinc (Zn) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-ZN
High Purity Zirconium (Zr) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-ZR
High Purity Hafnium (Hf) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-HF
High Purity Rhenium (Re) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-RE
High Purity Iridium (Ir) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-IR
High Purity Silicon Dioxide (SiO2) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-SIO2
High Purity Hafnium Oxide (HfO2) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-HfO2
High Purity Titanium Dioxide (TiO2) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-TiO2
High Purity Zirconium Oxide (ZrO2) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-ZrO2
High Purity Tungsten Oxide (WO3) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-WO3
High Purity Niobium Oxide (Nb2O5) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-Nb2O5
High Purity Tantalum Oxide (Ta2O5) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-Ta2O5
High Purity Molybdenum Oxide (MoO3) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-MoO3
High Purity Aluminum Oxide (Al2O3) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-Al2O3
High Purity Zinc Oxide (ZnO) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-ZnO
High Purity Bismuth Oxide (Bi2O3) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-Bi2O3
High Purity Chromium Oxide (Cr2O3) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-Cr2O3
High Purity Nickel Oxide (Ni2O3) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-Ni2O3
High Purity Vanadium Oxide (V2O3) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-V2O3
High Purity Iron Oxide (Fe3O4) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-Fe3O4
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Explores the origins, principles, and applications of hot isostatic pressing in various material fields.
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This article discusses the manufacturing and optimization of PVD sputtering targets, focusing on techniques like hot isostatic pressing and high pressure heat treatment.
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Hot Isostatic Pressing(HIP ) is a technology used to densify materials at high temperatures and pressures. The process involves placing a material in a sealed container, which is then pressurized with an inert gas and heated to a high temperature.
FTIR (Fourier Transform Infrared) spectroscopy is a powerful analytical technique for identifying and characterizing chemical compounds based on their infrared absorption spectra.
Cold isostatic pressing (CIP) services utilize extremely high pressures to sterilize products or cold compact powders. CIP is particularly effective in producing complex shapes and increasing the final density of materials.
Warm Isostatic Press (WIP) is a type of isostatic press that uses a combination of heat and pressure to create high-quality parts. The WIP process involves placing a part inside a flexible mold, which is then filled with a gas or liquid media.
Cold Isostatic Pressing (CIP) is a powder compaction technique that involves applying uniform pressure to a powder-filled container from all directions.
Cold isostatic pressing (CIP) is a method of processing materials by using liquid pressure to compact powder. It is similar to metal mold processing and is based on Pascal's law.
Warm Isostatic Pressing (WIP) is a high-pressure technique used to enhance the density and reduce the defects of materials. It involves subjecting a material to high pressure and high temperature while simultaneously applying an inert gas, which uniformly compresses the material.
Isostatic pressing is a process used in the production of high-performance materials and components. It involves applying uniform pressure on all sides of a material or part, resulting in a more uniform density and improved mechanical properties.
Investing in a high-quality sintering oven is crucial for dental laboratories that want to produce high-quality zirconia restorations consistently.
The two most common techniques used for thin film deposition are evaporation and sputtering.
Tungsten has a number of properties that make it well-suited for use in high-temperature furnaces.