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KinTek sample preparation equipment includes sample crushing,milling, as while as while sieving equipment, hydraulic press equipment includes manual press, electric press, isostatic press, hot press and press filtering machine.
KinTek supplies a broad range of high-temperature furnaces, including lab, pilot production, and industrial production furnaces, with a temperature range of up to 3000 ℃. One of KinTek's advantages is the ability to create custom-made furnaces tailored to specific functions, such as different heating methods and speeds, extra high and dynamic vacuums, controlled atmospheres and gas circuits, automated mechanical structures, and software and hardware development.
KinTek offers a range of lab consumables and materials, including evaporation materials, targets, metals, electrochemistry parts, as well as powders, pellets, wires, strips, foils, plates, and more.
KinTek bio-chem equipment comprises rotary evaporators, glass and stainless steel reactors, distillation systems, circulating heaters and chillers, as well as vacuum equipment.
High Purity Antimony (Sb) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-SB
High Purity Scandium (Sc) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-SC
High Purity Selenium (Se) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-SE
High Purity Silicon (Si) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-SI
High Purity Tin (Sn) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-SN
High Purity Tantalum (Ta) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-TA
High Purity Tellurium (Te) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-TE
High Purity Titanium (Ti) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-TI
High Purity Vanadium (V) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-V
High Purity Tungsten (W) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-W
High Purity Zinc (Zn) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-ZN
High Purity Zirconium (Zr) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-ZR
High Purity Hafnium (Hf) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-HF
High Purity Rhenium (Re) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-RE
High Purity Iridium (Ir) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-IR
High Purity Lanthanum (La) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-LA
High Purity Erbium (Er) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-ER
High Purity Cerium (Ce) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-CE
High Purity Samarium (Sm) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-SM
High Purity Europium (Eu) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-EU
High Purity Gadolinium (Gd) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-GD
High Purity Terbium (Tb) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-TB
High Purity Dysprosium (Dy) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-DY
High Purity Ytterbium (Yb) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-YB
High Purity Lutetium (Lu) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-LU
High Purity Neodymium (Nd) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-ND
High Purity Holmium (Ho) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-HO
High Purity Silicon Dioxide (SiO2) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-SIO2
High Purity Hafnium Oxide (HfO2) Sputtering Target / Powder / Wire / Block / Granule
Item Number : LM-HfO2
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Dive into the comprehensive guide on Warm Isostatic Pressing (WIP), its technology, applications, and benefits in material processing. Discover how WIP enhances material properties and its role in advanced manufacturing.
Explore the advanced features and applications of Spark Plasma Sintering Furnaces (SPS) in material science. Learn how SPS technology offers rapid, efficient, and versatile sintering for various materials.
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Discover the best practices and technologies for measuring coating thickness using handheld gauges. Ideal for electroplating, automotive paint, and powder coatings.
Explore the intricacies of handheld coating thickness gauges, their applications in electroplating, automotive paint, and powder coatings. Learn how to choose and use these instruments effectively for quality control and cost efficiency.
Precautions for installing silicon carbide stic.
Learn about the scientific principle of sieving, including the process of separating particles based on size, types of laboratory test sieves. Discover how sieving impacts various industries and the accuracy of particle sizing measurements.
Discover the world of Spark Plasma Sintering Furnaces (SPS). This comprehensive guide covers everything from its advantages and applications to its process and equipment. Learn how SPS furnaces can revolutionize your sintering operations.
Hot Isostatic Pressing(HIP ) is a technology used to densify materials at high temperatures and pressures. The process involves placing a material in a sealed container, which is then pressurized with an inert gas and heated to a high temperature.
FTIR (Fourier Transform Infrared) spectroscopy is a powerful analytical technique for identifying and characterizing chemical compounds based on their infrared absorption spectra.
Cold isostatic pressing (CIP) services utilize extremely high pressures to sterilize products or cold compact powders. CIP is particularly effective in producing complex shapes and increasing the final density of materials.
Warm Isostatic Press (WIP) is a type of isostatic press that uses a combination of heat and pressure to create high-quality parts. The WIP process involves placing a part inside a flexible mold, which is then filled with a gas or liquid media.
The isostatic pressing process was pioneered in the mid-1950s and has steadily grown from a research curiosity to a viable production tool.Many industries apply this technique for the consolidation of powders or defect healing of castings. The process is used for a range of materials, including ceramics, metals, composites, plastics, and carbon.It has found wide application in industries for the consolidation of powders or defect healing of castings. It offers unique benefits for ceramic and refractory applications, allowing for the formation of product shapes to precise tolerances and reducing the need for costly machining.
The goal of most powder-based manufacturing processes, such as powder metallurgy (PM), is to produce dense parts with less than 1% porosity without melting the starting material. The loose powder used in these processes typically has a low stacking density, with a theoretical maximum density of only 64% for randomly stacked perfectly spherical particles. However, by using proper powder particle size distributions or deformable powders, packing densities of over 90% can be achieved.
Cold Isostatic Pressing (CIP) is a powder compaction technique that involves applying uniform pressure to a powder-filled container from all directions.
Cold isostatic pressing (CIP) is a method of processing materials by using liquid pressure to compact powder. It is similar to metal mold processing and is based on Pascal's law.
Isostatic pressing is a manufacturing process used to shape and consolidate materials by applying equal pressure from all directions. The technique involves placing a material in a pressure vessel and applying hydrostatic pressure to the material.
Warm Isostatic Pressing (WIP) is a high-pressure technique used to enhance the density and reduce the defects of materials. It involves subjecting a material to high pressure and high temperature while simultaneously applying an inert gas, which uniformly compresses the material.