Microwave plasma works by utilizing microwave energy to ionize gases, creating a plasma state that facilitates chemical reactions and material deposition.
How does microwave plasma work? Explained in 6 Simple Steps
1. Gas Introduction and Pressure Control
The process begins by introducing reactant gases such as CH4, H2, Ar, O2, N2, etc., into a cavity under controlled pressure.
The MPCVD (Microwave Plasma Chemical Vapor Deposition) machine precisely controls the flow of these gases and the pressure within the cavity.
2. Microwave Generation and Introduction
A 6KW solid-state microwave generator produces microwaves that are directed into the cavity through a waveguide.
These microwaves create an intense electromagnetic field within the cavity.
3. Formation of Plasma
Under the influence of the microwave field, the reaction gases are transformed into a plasma state.
This plasma forms a ball above the diamond substrate.
The high energy of the microwave field causes electrons in the gas molecules to oscillate violently, leading to ionization and the formation of a plasma.
4. Temperature and Energy Management
The plasma's high temperature heats the substrate, facilitating the deposition process.
Excess heat is managed by a water cooling unit, which dissipates the heat to maintain optimal conditions within the cavity.
5. Chemical Reactions and Deposition
The plasma's high-energy electrons promote chemical reactions that are crucial for the deposition of materials like diamond.
The plasma enhances the deposition efficiency by creating a chemically reactive environment at relatively low temperatures.
This is due to the highly energetic electrons' ability to ionize and dissociate gas molecules, leading to the formation of free radicals and active sites on the substrate.
6. Selective Growth and Efficiency
Microwave plasma enhances the selective growth of materials by providing a high ionization percentage and good substrate specificity.
This is particularly evident in the growth of vertically aligned carbon nanotubes using MW-CVD (Microwave Plasma-Enhanced Chemical Vapor Deposition).
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